Continuous instantaneous exposure photocuring printer provided with anti-sticking resistance-reducing nano-structured tank bottom

A nanostructure and printer technology, applied in 3D object support structures, metal processing equipment, manufacturing tools, etc., can solve problems such as large interface adhesion, parts processing failure, peeling failure, etc., to reduce adhesion, resin The effect of reduced flow resistance, continuous and fast printing

Active Publication Date: 2016-07-27
XI AN JIAOTONG UNIV
View PDF5 Cites 24 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The main problem in the constrained surface exposure process is that the interface adhesion force that needs to be overcome when the cured resin layer is peeled from the bottom of the groove is large, and the resin will repeatedly form a cured layer on the bottom surface of the molding chamber and peel off during the peeling process, resulting in Part processing failed

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Continuous instantaneous exposure photocuring printer provided with anti-sticking resistance-reducing nano-structured tank bottom
  • Continuous instantaneous exposure photocuring printer provided with anti-sticking resistance-reducing nano-structured tank bottom
  • Continuous instantaneous exposure photocuring printer provided with anti-sticking resistance-reducing nano-structured tank bottom

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0021] The present invention will be described in further detail below in conjunction with the accompanying drawings and specific embodiments.

[0022] In one embodiment, the printer includes: a curing light source, a micromirror array, a resin tank, a pallet for carrying printed parts, a side support plate, a feeding device, and a base;

[0023] The base is used to fix the curing light source, the micromirror array and the side support plate; the resin tank and the feed device are fixed on the side support plate; the supporting plate carrying the printed parts is connected to the feed device;

[0024] The surface of the resin tank is made of air-permeable and liquid-repellent material, and the surface of the resin tank has a quasi-periodic nanostructure.

[0025] In this embodiment, the breathable and lyophobic material used on the surface of the resin tank has good permeability to oxygen and is lyophobic. The resin tank is made of breathable material, and the permeable oxyg...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention discloses a continuous instantaneous exposure photocuring printer provided with an anti-sticking resistance-reducing nano-structured tank bottom. The printer comprises a curing light source, a micromirror array, a resin tank, a bearing plate for bearing printing parts, a side supporting plate, a feeding device and a base. The base is used for fixing the curing light source, the micromirror array and the side supporting plate. The resin tank and the feeding device are fixed to the side supporting plate. The bearing plate for bearing the printing parts is connected with the feeding device. The surface of the resin tank is made of a breathable lyophobic material, and the surface of the resin tank is of a quasi-periodical nano structure; the drag force in the lifting process for part printing is reduced through the nano lyophobic structure, and the contact area between resin and the boundary of the tank bottom is reduced; and the light transmittance can be increased through a sub-wavelength nano-structured array on the surface of the tank bottom. By the adoption of the continuous instantaneous exposure photocuring printer provided with the anti-sticking resistance-reducing nano-structured tank bottom, the adhesive force between the bottom of a part and the surface of the tank bottom can be obviously reduced in the printing process, and thus continuous and rapid printing of high-precision complex microstructures is achieved.

Description

technical field [0001] The invention belongs to the field of surface exposure 3D printing, and in particular relates to a photocuring printer for continuous rapid exposure of the groove bottom of anti-adhesive and drag-reducing nanostructures. Background technique [0002] Surface exposure 3D printing is to generate a layered contour mask, and one exposure completes the curing of one layer of the solid part, which can significantly improve the molding efficiency. Surface exposure molding is divided into two methods: free surface exposure (top exposure type) and constrained surface exposure (bottom exposure type). Compared with the free surface exposure method, the constrained surface exposure has the following advantages: material saving; the cured layer is not in contact with the air, avoiding the problem of oxygen imitation curing, high precision; no need for resin re-spreading and scraping action, high efficiency ; Avoid possible damage to the fine structure by scraping....

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): B29C67/00B33Y30/00
CPCB33Y30/00B29C64/124
Inventor 王莉卢秉恒梁正和王权岱刘伟王影杨志强段辉
Owner XI AN JIAOTONG UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products