X-ray pinhole camera for intense laser light condition and installation and adjustment method

A pinhole camera and X-ray technology, which is applied in optics, instruments, photography, etc., can solve problems such as X-ray pinhole camera failure, and achieve the effects of saving adjustment time, increasing accuracy, and improving signal-to-noise ratio

Active Publication Date: 2016-07-27
中国工程物理研究院上海激光等离子体研究所
View PDF5 Cites 10 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

When the high-energy g-rays are strong enough and the background noise is large enough, the pinhole

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • X-ray pinhole camera for intense laser light condition and installation and adjustment method
  • X-ray pinhole camera for intense laser light condition and installation and adjustment method
  • X-ray pinhole camera for intense laser light condition and installation and adjustment method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0034] Such as image 3 , Figure 4 with Figure 5 As shown, this embodiment is used for an X-ray pinhole camera under strong laser conditions, and the pinhole camera includes a pinhole plate 2, a pinhole seat housing 3, a front light tube 4, a grazing incidence mirror chamber, and a rear light tube 7. Film chamber 8, film cassette 9, filter frame 10, filter disc 10-1, negative film 10-2, two-dimensional adjustment laser seat 11, semiconductor laser 12 and two-dimensional adjustment frame 15, in the film chamber 8 A two-dimensional adjustment laser seat 11 is fixedly arranged on the outside, and a semiconductor laser 12 is installed on the side corresponding to the film chamber 8 on the two-dimensional adjustment laser seat 11. A through hole for adjusting the passage of the laser light; the grazing incidence mirror chamber includes a mirror chamber housing 5, a light blocking lead plate 6, a grazing incidence mirror 13 and a two-dimensional adjustment grazing incidence mirr...

Embodiment 2

[0047] Such as image 3 , Figure 4 with Figure 5 As shown, the present embodiment is used for an X-ray pinhole camera under strong laser conditions. In order to realize high-temperature plasma X-ray imaging under strong laser irradiation and high background noise conditions, the pinhole camera includes a pinhole plate 2, a pinhole Housing housing 3, front light tube 4, grazing incidence mirror room, rear light tube 7, film chamber 8, film box 9, filter frame 10, filter 10-1, film 10-2, two-dimensional adjustment laser Seat 11, semiconductor laser 12 and two-dimensional adjustment frame 15, two-dimensional adjustment laser seat 11 is fixedly arranged on the outside of described film chamber 8, semiconductor laser is installed on the side corresponding to film chamber 8 on two-dimensional adjustment laser seat 11 12. At the optical axis positions of the two-dimensional adjustment laser seat 11 and the film chamber 8, there are through holes for the adjustment laser to pass t...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

PropertyMeasurementUnit
Thicknessaaaaaaaaaa
Sizeaaaaaaaaaa
Lengthaaaaaaaaaa
Login to view more

Abstract

The invention relates to an X-ray pinhole camera for an intense laser light condition. The pinhole camera comprises a pinhole plate, a pinhole base housing, a front light-passing barrel, a grazing incidence mirror room, a back light-passing barrel, a negative film room, a negative film box, a filter disc frame, a filter disc, a negative film, a two-dimensional adjusting laser base, a semiconductor laser device and a two-dimensional adjusting bracket, wherein the two-dimensional adjusting laser base is fixedly arranged at the outer side of the negative film room; the semiconductor laser device is arranged at one side, corresponding to the negative film room, of the two-dimensional adjusting laser base; and through holes through which an adjusting laser light passes are formed in optical axis positions of the two-dimensional adjusting laser base and the negative film room. The influence of an ultra-intense g ray under the intense laser light condition is effectively eliminated; the X-ray pinhole camera is well applied to high-temperature dense plasma imaging under the intense laser light condition; and quick and stable installation and adjustment on the X-ray pinhole camera can be carried out through a laser-assisted targeting method.

Description

technical field [0001] The invention relates to the field of imaging, in particular to an X-ray pinhole camera and an installation and adjustment method used under strong laser conditions, and is a high-temperature plasma X-ray imaging camera that can be used under conditions of strong laser irradiation and high background noise. Grazing incidence X-ray pinhole camera. Background technique [0002] X-ray pinhole camera is one of the important diagnostic equipment in high-temperature plasma imaging diagnosis, and is widely used in various researches related to high-temperature dense laser plasma. The X-ray pinhole camera can obtain information such as the shape of the laser focal spot, temperature distribution, size, and contour by self-illuminating imaging of the plasma to be measured, which is of great significance for qualitatively understanding the state of the laser focus and the state of the plasma. [0003] The traditional X-ray pinhole camera is based on the principl...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): G03B42/02
CPCG03B42/025
Inventor 王琛安红海熊俊方智恒王伟孙今人王轶文张众
Owner 中国工程物理研究院上海激光等离子体研究所
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap