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scanning electron microscope

An electron microscope and scanning technology, applied to circuits, discharge tubes, electrical components, etc., can solve problems such as image quality degradation and electrification

Active Publication Date: 2019-05-14
HAMAMATSU PHOTONICS KK
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

On the other hand, in the case of measuring an insulator sample, etc., a charging phenomenon occurs and the image quality deteriorates.

Method used

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  • scanning electron microscope
  • scanning electron microscope
  • scanning electron microscope

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Embodiment Construction

[0024] [Description of Embodiments of the Invention of the Present Application]

[0025] First, the contents of the embodiments of the present invention will be individually listed and described.

[0026] (1) The SEM (scanning electron microscope) according to the present embodiment includes an electron gun, an irradiation unit, and a detector. The electron gun produces electron beams. The irradiation unit irradiates the sample with an electron beam while scanning the electron beam irradiation position on the sample. The detector detects electrons generated in the sample in response to electron beam irradiation on the sample. In particular, the detector has a first structure consisting of an MCP (micro channel plate) for multiplying secondary electrons generated corresponding to the incident electrons generated in the sample, a dynode, and an anode, or is composed of an MCP, an anode, and an electrode of the second structure.

[0027] In the detector having the first struc...

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Abstract

An embodiment of the invention relates to an SEM enabling a surface analysis of a sample at a high throughput. The SEM has an electron gun, an irradiation unit, and a detector. The detector, as a first structure, includes an MCP, an anode, and a dynode. The dynode is set at a potential higher than a potential of an output face of the MCP and the anode is set at a potential higher than that of the dynode. The anode is disposed on the dynode side with respect to an intermediate position between the output face of the MCP and the dynode. The anode has an aperture for letting electrons from the output face of the MCP pass toward the dynode.

Description

technical field [0001] The present invention relates to a scanning electron microscope (Scanning Electron Microscope, hereinafter referred to as "SEM"). Background technique [0002] For example, in the SEM described in Japanese Unexamined Patent Application Publication No. 2007-42513 (Patent Document 1), a finely concentrated electron beam is used as a probe to scan the electron beam irradiation position while irradiating the sample, and a detector detects the corresponding electron beam. Electrons (secondary electrons or reflected electrons) are generated at various positions of the sample by irradiation with the beam. Through this electronic detection, SEM can carry out the surface analysis of the sample. Compared with optical microscopes, SEM has advantages in magnification, and is indispensable as a device for visualizing nanoscale fine structures such as semiconductor mask pattern inspection. [0003] When an electron beam is irradiated to a sample, secondary electro...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01J37/28H01J37/244
CPCH01J37/244H01J37/28H01J2237/244H01J2237/2801
Inventor 林雅宏
Owner HAMAMATSU PHOTONICS KK