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Application method of uv light and application device for uv light film treatment

An application method and thin-film treatment technology, applied in the direction of cleaning methods and appliances, chemical instruments and methods, etc., can solve problems such as constraints, and achieve the effects of improving utilization efficiency, increasing energy density of irradiated light, and shortening irradiation time

Inactive Publication Date: 2018-07-20
CHANGCHUN INST OF OPTICS FINE MECHANICS & PHYSICS CHINESE ACAD OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

At the same time, when there are other components that cannot be irradiated by UV light near the processed component, the current direct radiation method of UV lamp will be restricted

Method used

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  • Application method of uv light and application device for uv light film treatment
  • Application method of uv light and application device for uv light film treatment
  • Application method of uv light and application device for uv light film treatment

Examples

Experimental program
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Effect test

Embodiment 1

[0034] refer to figure 1 As shown, the present embodiment provides a method for applying UV light, comprising the following steps:

[0035] S1: Equipped with a UV light generating device to generate UV light through a UV lamp;

[0036] S2: collecting UV light, using a concave reflector to collect UV light;

[0037] S3: focusing the UV light, using a convex lens or mirror group to focus the above UV light into a beam;

[0038] S4: Transmission of UV light beam, using ultraviolet fiber to transmit UV light beam to the application site;

[0039] S5: Beam expansion, using a convex lens to convert the outgoing light of the ultraviolet fiber pigtail into a parallel beam;

[0040] S6: Light guide, export the above parallel light beams and inject them into the surface of the product to be processed.

[0041] The spectrum of UV light used in this embodiment mainly includes ultraviolet light with wavelengths of 185 nm and 254 nm. A suitable wavelength can also be selected accordin...

Embodiment 2

[0048] refer to figure 2 and image 3 As shown, the present embodiment provides a UV light film processing application device, which includes a UV light generating device 10, and the UV light generating device 10 includes a UV lamp 101, and also includes a collecting device 102, a fiber collimator 103, an ultraviolet optical fiber 104 and a beam expander 105 and other components, wherein the collection device 102 includes a concave reflector 1021 and a light-shielding cylinder 1022 connected to the concave reflector 1021 . The UV lamp 101 is fixed inside the concave reflector 1021 and placed perpendicular to the axis of the concave reflector 1021 . The UV light is reflected by the concave reflector 1021 into the light-shielding cylinder 1022 and collected by a convex lens 1023 . The rear of the convex lens 1023 is provided with a fiber collimator 103, the focused UV light is projected onto the fiber collimator 103, and the fiber collimator 103 couples the UV light into the u...

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PUM

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Abstract

The present invention relates to a method for applying UV light, comprising the steps of: a. configuring a UV light generating device, and generating UV light through a UV lamp tube; b. collecting UV light, and using a concave reflector to collect UV light; c. focusing the UV light, Use a convex lens or mirror group to focus the above UV light into a beam; d, transmit the UV beam, use the ultraviolet fiber to transmit the UV beam to the application site; e, expand the beam, use the convex lens to convert the outgoing light of the ultraviolet fiber pigtail into a parallel beam; f , Light guide, the above-mentioned parallel light beam is exported, and injected into the surface of the product to be processed. On the one hand, the present invention can break through the restrictions on the application occasions and geometric space of UV light caused by the close-range irradiation of the sample surface for conventional UV light cleaning; on the other hand, it can improve the utilization efficiency of UV light and increase the energy of irradiated light on the sample surface Density, thereby improving the cleaning effect of the sample surface and shortening the required irradiation time. The invention also provides an application device for UV light film treatment.

Description

technical field [0001] The invention relates to the application of focused UV light in the field of deep ultraviolet optical elements, in particular to a UV light application method and a UV light film processing application device. Background technique [0002] In recent years, deep ultraviolet optical applications represented by ArF excimer lasers and free electron lasers with wavelengths below 200nm have received increasing attention and achieved considerable development. In particular, the ArF excimer 193nm laser has achieved great success in many fields including fine microprocessing of materials, deep ultraviolet lithography, material processing, laser marking, etc., excimer laser medical treatment, and scientific research. Wide and important applications, research on deep ultraviolet optics related technologies has great social and economic value. The continuous development of deep ultraviolet laser optical systems and applications poses new challenges to the perform...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B08B7/00
CPCB08B7/0057
Inventor 邓文渊金春水靳京城李春
Owner CHANGCHUN INST OF OPTICS FINE MECHANICS & PHYSICS CHINESE ACAD OF SCI