Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Preparation method of anti-dazzle glass

An anti-glare and glass technology, applied in the field of advanced photo frames, can solve problems such as poor performance, low glass transmittance, environmental pollution, etc., and achieve the effects of excellent anti-glare performance, uniform concave-convex structure, and high etching rate

Active Publication Date: 2016-08-31
CHINA TRIUMPH INT ENG
View PDF2 Cites 5 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] At present, anti-glare glass preparation technology mainly uses chemical corrosion methods such as hydrofluoric acid and sulfuric acid to process the glass surface into a relatively rough surface, but there are some defects, such as the uneven flow of corrosive liquid on the glass surface will make the processed glass Defects are caused by certain lines; after the corrosive liquid is sprayed on the glass surface, it is difficult to control the process parameters such as corrosion time and spray pressure, resulting in uneven structure of the glass surface and poor performance; when processing single-sided anti-glare glass, it will be caused The corrosive liquid penetrates into the back of the glass and causes defects; the light transmittance of the glass processed by the chemical corrosion method is low, which cannot meet the requirements of high light transmittance, which seriously affects the imaging effect of the product; due to the strong corrosiveness of strong acid, it is harmful to the environment Cause a lot of pollution, and it is easy to cause harm to the operator's body

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Preparation method of anti-dazzle glass

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0026] After the electronic display glass is ultrasonically cleaned, it is placed on the substrate holder of the DC magnetron sputtering equipment, and the ZnO ceramic target is used as the target material. The base distance of the target is about 7cm, and the background vacuum is 8.0×10 -4 Above Pa, fill with high-purity Ar gas, and pre-sputter for 10 minutes to remove oxides and other impurities on the target surface. After pre-sputtering, fill it with high-purity Ar gas, the flow rate of Ar gas is 30sccm, the working pressure is 0.5Pa, and the sputtering power density is 6W / cm 2 , the substrate temperature is 300 degrees Celsius, the deposition is 10 minutes, and the film thickness is about 800nm. After the coating is completed, the ZnO-coated glass is taken out, soaked in dilute HCl with a mass fraction of 0.5% for etching, and taken out after etching for 45 seconds. After drying, put it into a plasma etching machine. The etching gas is Ar gas, the flow rate is 30sccm, an...

Embodiment 2

[0028] After the electronic display glass is ultrasonically cleaned, it is placed on the substrate holder of the DC magnetron sputtering equipment, and the ZnO ceramic target is used as the target material. The base distance of the target is about 7cm, and the background vacuum is 8.0×10 - Above 4Pa, fill with high-purity Ar gas, and pre-sputter for 10 minutes to remove oxides and other impurities on the target surface. After pre-sputtering, fill with high-purity Ar gas, the flow rate of Ar gas is 30 sccm, the working pressure is 0.5Pa, and the sputtering power density is 6W / cm 2 , the substrate temperature is 300 degrees Celsius, the deposition is 10 minutes, and the film thickness is about 800nm. After the film coating is completed, the ZnO film glass is taken out, soaked and etched in KOH with a mass fraction of 33%, and taken out after etching for 135s. After drying, put it into a plasma etching machine, the etching gas is Ar gas, the flow rate is 30 sccm, and the dischar...

Embodiment 3

[0030] After the electronic display glass is ultrasonically cleaned, it is placed on the substrate holder of the DC magnetron sputtering equipment, and the ZnO ceramic target is used as the target material. The base distance of the target is about 7cm, and the background vacuum is 8.0×10 -4 Above Pa, fill with high-purity Ar gas, and pre-sputter for 10 minutes to remove oxides and other impurities on the target surface. After pre-sputtering, fill with high-purity Ar gas, the flow rate of Ar gas is 30 sccm, the working pressure is 0.5Pa, and the sputtering power density is 6W / cm 2 , the substrate temperature is 300 degrees Celsius, the deposition is 10 minutes, and the film thickness is about 800nm. After the coating is completed, the ZnO-coated glass is taken out, soaked in dilute HCl with a mass fraction of 0.5% for etching, and taken out after etching for 45 seconds. After drying, put it into a plasma etching machine. The etching gas is CF4 gas, the flow rate is 10sccm, and...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
thicknessaaaaaaaaaa
reflectanceaaaaaaaaaa
hazeaaaaaaaaaa
Login to View More

Abstract

A preparation method of anti-dazzle glass includes the steps of: (a) depositing a layer of ZnO thin film on a surface of a glass substrate; (b) etching the ZnO thin film with an acid solution or an alkaline solution in low concentration to form a three-dimension mask plate; and (c) etching the glass with the three-dimension mask plate ZnO thin film formed thereon with plasma to prepare the glass having an uneven structure. In the method, the anti-dazzle glass is prepared by pre-preparing the three-dimension mask plate and then performing plasma etching. The method has high etching speed and uniform etching pattern and can be used for forming a uniform uneven structure. The anti-dazzle glass has excellent anti-dazzle performance, has low damage on human body and is suitable for a high-grade display panel.

Description

technical field [0001] The invention relates to a preparation method of anti-glare glass, in particular to the fields of TV splicing walls, outdoor super-large display screens, flat-screen TVs, rear-projection TVs, liquid crystal displays, touch screens, industrial instruments, and advanced picture frames. Background technique [0002] Anti-glare glass, also known as non-reflective glass or anti-reflective glass, is a kind of glass whose surface is specially treated. Compared with glass, it has a lower reflectance, basically does not affect the transmission of light, and the reflectance of light is reduced from 8% to less than 4%. [0003] In our daily life, we all have the experience of being attacked by glare, partly from the glare light source, and partly from the reflection of glare; when we operate the computer, we are often troubled by the reflection of the scenery outside the monitor on the surface of the monitor and cannot see the displayed content clearly; Another ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): C03C17/23C03C15/00C03C17/245
CPCC03C15/00C03C17/23C03C17/245C03C2217/216C03C2217/732
Inventor 王芸张宽翔姚婷婷蒋继文金克武杨勇曹欣徐根保
Owner CHINA TRIUMPH INT ENG
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com