Photomask and manufacturing method of color film substrate

Abstract

The invention provides a photomask and a manufacturing method of a color film substrate. A light transmitting region of the photomask is divided into a main light transmitting region and an auxiliary light transmitting region, wherein light can completely transmit through the main light transmitting region, light only can transmit through part of the auxiliary light transmitting region, the auxiliary light transmitting region surrounds the main light transmitting region and comprises a plurality of lightproof marking frames which successively surround the main light transmitting region from inside to outside, and a light transmitting slit is formed between every two adjacent masking frames. The invention further provides the manufacturing method of the color film substrate. According to the photomask and the manufacturing method of the color film substrate, the interference degree of light irradiated to the auxiliary light transmitting region can be adjusted by adjusting the widths and the quantity of the slits in the auxiliary light transmitting region and the distance between every two adjacent slits, so that exposure degree of a color resistance material which corresponds to the position of the auxiliary light transmitting region is controlled, and a color resistance layer which is not overlapped, and is small in critical size offset, small in horn, large in taper angle and good in flatness of a film surface.

Description

technical field [0001] The invention relates to the field of display technology, in particular to a method for manufacturing a photomask and a color filter substrate. Background technique [0002] With the development of display technology, liquid crystal displays (Liquid Crystal Display, LCD) and other flat display devices are widely used in mobile phones, televisions, personal Various consumer electronic products such as digital assistants, digital cameras, notebook computers, and desktop computers have become the mainstream of display devices. [0003] Usually, the liquid crystal display panel consists of a color filter substrate (CF, Color Filter), a thin film transistor substrate (TFT, Thin Film Transistor), a liquid crystal (LC, Liquid Crystal) sandwiched between the color filter substrate and the thin film transistor substrate, and a sealant frame (Sealant ), the molding process generally includes: the front-end array (Array) process (film, yellow light, etching and ...

AI Technical Summary

Problems solved by technology

Existing photomasks for making color resist layers include: a light-transmitting area and a light-shielding area surrounding the light-transmitting area, using the light-transmitting area to expose the corresponding color-resist material of each sub-pixel, and then developing to remove The exposed color-resist material, retaining the exposed color-resist material, forms several color-resist units corresponding to each sub-pixel, however, please refer to figure 1 , in the prior art, when light is exposed, diffraction occurs when light passes through the edge of the light-transmitting area, resulting in large overlap between the produced color-resist units 100, large critical dimension offset, and excessively high horns. Poor surface flatness

Based on this, at present, the development of high-definition color-resist materials is mainly used to solve the above problems. However, the development cycle of materials is long, and it is difficult to quickly respond to the needs of small-size panels with rapid iterations.

Images