Monocrystalline/polycrystalline silicon chained acid-alkali integrated texture and preparing method thereof
A single-polysilicon, chain technology, applied in the field of solar photovoltaic, can solve the problems of difficult acid-base integrated texturing, etc., and achieve the effects of improving equipment utilization and labor costs, saving costs, and reducing energy consumption
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Embodiment 1
[0014] The preparation process of polycrystalline velvet goes through the following processes respectively: firstly acid velvet—use O 3 / HF / HCL for acid texturing at room temperature, through O 3 The strong oxidizing property of the silicon wafer forms an oxide layer on the surface of the silicon wafer, and then forms a textured surface through the etching effect of HF, in which O 3 The concentration is 30ppm, the volume ratio of HF / HCl is controlled at 2:1, and the time is about 5min; carry out alkali prewash again—use KOH / H 2 The O solution is 4:100, and the time is 1min to neutralize the acid in the acid fleece; then further alkali washing - using KOH / H 2 o 2 Solution, the volume ratio is 8:1, and the time is 1min; finally pickling process - use HF / HCl liquid to clean and dehydrate the surface of the silicon wafer, which is conducive to drying, and the volume ratio is controlled at 3 :1, the time is about 2 minutes.
Embodiment 2
[0016] The single crystal texturing process is respectively through the following processes: first carry out acid cashmere-acid pre-washing (O 3 / HF / HCl), effectively removes the dirt on the surface of the silicon wafer, and does not produce spots such as roller marks; where O 3 The concentration is 40ppm, the volume ratio of HF / HCl is 1:1, the time is about 4min, and the time for polycrystalline acid wool is slightly shorter; carry out alkali prewashing again—use KOH / H 2 The O solution is prepared at a ratio of 3:100, and the time is about 1.5 minutes to neutralize the acid in the acid fleece; then the alkali fleece is used—KOH / additive is used, the volume ratio is 10:1, the solution temperature is 80°C, and the texture time is 5 minutes ; The next step is to carry out alkali washing - using KOH / H 2 o 2 solution, the volume ratio is 10:1, and the time is 5 minutes; pickling at the end—use HF / HCl liquid to clean and dehydrate the surface of the silicon wafer, which is conven...
Embodiment 3
[0018] First carry out the preparation technology of polycrystalline texture making The preparation technology of polycrystalline texture is respectively through the following flow process: first carry out pickling cashmere—use O 3 / HF / HCL for acid texturing at room temperature, through O 3 The strong oxidizing property of the silicon wafer forms an oxide layer on the surface of the silicon wafer, and then forms a textured surface through the etching effect of HF, in which O 3 The concentration is 30ppm, the volume ratio of HF / HCl is 2:1, and the time is about 5min; carry out alkali prewash again—use KOH / H 2 The O solution is 4:100, and the time is 1min to neutralize the acid in the acid fleece; then further alkali washing - using KOH / H 2 o 2 solution, the volume ratio is 8:1, and the time is 4min; finally, the pickling process is carried out-using HF / HCl liquid to clean and dehydrate the surface of the silicon wafer, which is beneficial to the drying, and the volume ratio i...
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