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A method, system and computer program product for generating high density registration maps for masks

A mapping and high-density technology, applied in the direction of originals for photomechanical processing, special data processing applications, and photolithography on patterned surfaces, etc., can solve problems such as rejection and insufficient coverage of reticles, and achieve enhanced acceptance or the effect of rejecting

Active Publication Date: 2016-11-23
KLA CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Therefore, using a limited number of samples from registration metrology, a pass mask is rejected or a fail mask is accepted due to insufficient coverage of the reticle

Method used

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  • A method, system and computer program product for generating high density registration maps for masks
  • A method, system and computer program product for generating high density registration maps for masks
  • A method, system and computer program product for generating high density registration maps for masks

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Embodiment Construction

[0059] In the figures, like reference numerals are used for similar elements or elements with similar functions. Furthermore, for the sake of brevity, only those reference numerals are shown in the figures that are necessary to discuss the corresponding figure.

[0060] In order to avoid an unduly lengthy description, well-known prior art coordinate measuring machines or metrology systems (such as KLA Tencor's IPRO series) need not be described in their entirety, which are incorporated herein in their entirety. For example, IPRO6 is a mask registration metrology tool designed to accurately measure and verify the pattern placement performance of masks for the 1X nm node. It enables extensive characterization of mask pattern placement errors, which are direct contributors to in-field wafer overlay errors.

[0061] The same applies to mask inspection tools that are fully incorporated into them (such as KLA Tencor's TERON TM series). Teron TM The reticle defect inspection syst...

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Abstract

A method and system for generating high density registration maps for masks is disclosed. A data preparation module generates a plurality of anchor points of the mask. Additionally, the data preparation module generates a plurality of sample points. Weights are generated as well in the data preparation module and the weights are used later on in the data fusion module. The positions of anchor points are measured with a registration tool in a mask coordinate system according to a generated recipe. The positions of sample points are determined with an inspection tool in a mask coordinate system according to a generated recipe. The measured positions of the anchor points and the measured positions of the sample points are passed to a data fusion module where a registration map is determined.

Description

[0001] Cross References to Related Applications [0002] This application claims priority to US Provisional Application No. 61 / 974,001, filed April 2, 2014, which is hereby incorporated by reference in its entirety. technical field [0003] The present invention relates to a method for generating a high density registration map of a mask. [0004] Furthermore, the invention relates to a system for generating a high density registration map of a mask. [0005] Furthermore, the present invention relates to a computer program product embodied on a non-transitory computer readable medium. Background technique [0006] A mask (also known as a photomask or reticle) is a device that physically stores a pattern. The pattern is transferred to the wafer by photolithography. [0007] Mask registration metrology and mask inspection have traditionally been divorced from each other due to their inherently conflicting requirements. [0008] Mask registration is typically performed usi...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/027H01L21/66
CPCG03F1/84H01L21/027H01L22/20G06F30/398
Inventor F·拉斯克M·M·丹尼斯帕纳P·苏布拉马尼扬熊亚霖
Owner KLA CORP