Color film substrate and manufacturing method thereof, display panel and display device
A color film substrate, base substrate technology, applied in the direction of nonlinear optics, instruments, optics, etc., can solve the problems of conductive protrusions and foreign matter residues, low yield of TFT-LCD products, etc., to reduce the possibility of common electrodes, Reduce the possibility of remaining near the spacer and the overlapping area of the color resist block and the black matrix, and improve the effect of product yield
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[0025] In order to make the object, technical solution and advantages of the present invention clearer, the implementation manner of the present invention will be further described in detail below in conjunction with the accompanying drawings.
[0026] figure 1 A schematic cross-sectional structure diagram of a color filter substrate provided by an embodiment of the present invention, as shown in figure 1 As shown, the color filter substrate includes a base substrate 10, a black matrix 20 disposed on the base substrate 10, a color resist layer, a common electrode layer 40, and a spacer wall 60 disposed on the common electrode layer 40. The resistance layer includes a plurality of color resistance blocks 30 .
[0027] figure 2 A top view of a color filter substrate provided in this embodiment. Such as figure 2 As shown, the black matrix 20 encloses a plurality of sub-pixel regions 31 distributed in an array on the base substrate 10 , and a plurality of color-resist blocks...
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Abstract
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