Gas reaction cavity for preparing YBCO strip by MOCVD

Abstract

The invention belongs to the technical field of film preparation, in particular to a gas reaction cavity for preparing a YBCO strip by MOCVD. The gas reaction cavity comprises a reaction copper pipe, intake and exhaust bins connected to two ends of the reaction copper pipe, and a cooling pipe. Two ends of the reaction copper pipe are connected to the intake and exhaust bins; a heat conducting strip is wound on the reaction copper pipe and the cooling pipe; the intake and exhaust bins are respectively provided with holes, and are on the same one straight line with the reaction copper pipe in middle of the reaction cavity; and a substrate penetrates through the holes in use. The whole reaction process is only concentrated in the reaction copper pipe in use; in the process from entering the reaction chamber to extraction of gas, the dispersion space is less, so that the utilization rate of a metal organic source is largely increased, and the cost is reduced; meanwhile, the synchronous film growth on two surfaces of the substrate can be realized; and the outer-surface uniformity and consistency of prepared films are guaranteed.

Description

technical field [0001] The invention belongs to the technical field of thin film preparation, and relates to a gas reaction chamber used for metal-organic chemical vapor deposition (MOCVD), which can be used for the preparation of YBCO superconducting strips, specifically a gas reaction chamber for preparing YBCO strips by MOCVD cavity. Background technique [0002] Metal-organic compound chemical vapor deposition, its English name is Metal-organic Chemical VaporDe7position, abbreviated as MOCVD, is a new type of vapor phase epitaxy growth technology developed on the basis of vapor phase epitaxy (VPE). Organic compounds of elements and hydrides of group V and VI elements are used as source materials for vapor deposition, and various III-V or II-VI compounds are grown on high-temperature substrates through diffusion, gas-phase reactions, and surface chemical reactions. Thin-layer single-crystal materials of semiconductors and their multicomponent solid solutions. Compared w...

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Problems solved by technology

However, the gas ejected from the double shower head structure will lead to uneven distribution of the temperature field directly under the shower head, resulting in uneven thickness of the deposited film, and this deposition method has low utilization rate of metal-organic sources and high cost

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