Film-forming coating liquid manufacturing method of film-forming coating liquid and film-covered base material

A manufacturing method and technology of coating liquid, applied in the direction of coating, etc., can solve the problems of difficulty in suppressing cracks, insufficient chemical resistance, low cross-linking degree of the coating, and achieve sufficient hardness, scratch resistance, resistance to Excellent chemical properties and hard to crack effect

Active Publication Date: 2017-03-15
JGC CATALYSTS & CHEM LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, when coating such an inorganic coating liquid material on such a resin, there is a problem that cracks are likely to occur, which may cause a defect of a display element in some cases.
[0006] On the other hand, the coating solution disclosed in Document 1 can provide a transparent film that cures at a relatively low temperature, but there is a problem that, for example, it is slightly difficult to suppress the occurrence of cracks when the substrate is a resin.
In addition, since the coating solution disclosed in Document 2 uses a metal alkoxide exemplified by MTMS having a non-bonding functional group, the crosslinking degree of the coating film is low and the chemical resistance is low when fired at a low temperature. Drug insufficiency

Method used

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  • Film-forming coating liquid manufacturing method of film-forming coating liquid and film-covered base material
  • Film-forming coating liquid manufacturing method of film-forming coating liquid and film-covered base material
  • Film-forming coating liquid manufacturing method of film-forming coating liquid and film-covered base material

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0155] Each process for manufacturing the coating liquid for film formation and the base material with a film is as follows. Table 1 shows the types and compounding quantities of each component to be compounded.

[0156] (preparatory process 1)

[0157] 4673.08 g of hexanediol (manufactured by Wako Pure Chemical Industries, Ltd.), 214.07 g of pure water, and 3.57 g of nitric acid with a concentration of 60% by mass were mixed and stirred for 5 minutes. Next, 1,2-bis(triethoxysilyl)ethane (manufactured by YAMANAKA HUTECH CORPORATION: SiO 2 Concentration: 33.8% by mass) 1055.55 g was stirred for 30 minutes to prepare a preparatory liquid 1-1 having a solid content concentration of 6.0% by mass.

[0158] (preparatory process 2)

[0159] 2966.06 g of hexanediol (manufactured by Wako Pure Chemical Industries, Ltd.), 148.66 g of acetylacetone (manufactured by Wako Pure Chemical Industries, Ltd.) as a component A carbonyl-containing organic compound, and Orgatix TA-10 (Matsumoto F...

Embodiment 2

[0170] Except for the following preparatory process, it carried out similarly to Example 1, the coating liquid (2) for film formation was prepared, and the base material (2-1)-(2-3) with a film was produced further. Then, it carried out similarly to Example 1, and evaluated.

[0171] (preparatory process 1)

[0172] 5841.36 g of hexanediol (manufactured by Wako Pure Chemical Industries, Ltd.), 267.58 g of pure water, and 4.46 g of nitric acid with a concentration of 60% by mass were mixed and stirred for 5 minutes. Next, 1,2-bis(triethoxysilyl)ethane (manufactured by YAMANAKA HUTECH CORPORATION: SiO 2 Concentration: 33.8% by mass) 1319.44 g was stirred for 30 minutes to prepare a preparatory liquid 1-2 having a solid content concentration of 6.0% by mass.

[0173] (preparatory process 2)

[0174] 1853.78 g of hexanediol (manufactured by Wako Pure Chemical Industries, Ltd.), 92.91 g of acetylacetone (manufactured by Wako Pure Chemical Industries, Ltd.) as a component A carbo...

Embodiment 3

[0176] Except for the following preparatory steps, it was carried out in the same manner as in Example 1 to prepare a coating solution (3) for film formation, and further to produce substrates (3-1) to (3-3) with a film. Then, it carried out similarly to Example 1, and evaluated.

[0177] (preparatory process 1)

[0178] 6620.20 g of hexanediol (manufactured by Wako Pure Chemical Industries, Ltd.), 303.26 g of pure water, and 5.05 g of nitric acid with a concentration of 60% by mass were mixed and stirred for 5 minutes. Next, 1,2-bis(triethoxysilyl)ethane (manufactured by YAMANAKA HUTECH CORPORATION: SiO 2 Concentration: 33.8% by mass) 1495.36 g was stirred for 30 minutes to prepare a preparatory solution 1-3 having a solid content concentration of 6.0% by mass.

[0179] (preparatory process 2)

[0180] 1112.27 g of hexanediol (manufactured by Wako Pure Chemical Industries, Ltd.), 55.75 g of acetylacetone (manufactured by Wako Pure Chemical Industries, Ltd.) as a component ...

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Abstract

The invention relates to a film-forming coating liquid manufacturing method of a film-forming coating liquid and a film-covered base material. According to the invention, the film-forming coating liquid is characterized in that: the film-forming coating liquid is formed by solving or diffusing at least any one (B component) of an organic compound (A component) which can form a chelate tegother with a metal alkoxide, 6-functional group silane and a hydrolyze condensate thereof and at least any one (C component) of the metal alkoxide and the hydrolyze condensate thereof. The mole ratio of the mole number of the A component and the mole number of the C component is more than 0.5 and less than 8. (as shown in the description) M (OR10)n (3).

Description

technical field [0001] The present invention relates to a coating liquid for forming a film used in the field of display elements such as touch panels, a method for producing the coating liquid for forming a film, and a substrate with a film. Background technique [0002] Conventionally, in a display device such as a touch panel, ITO (indium tin oxide) wiring patterns are visible, and display properties are degraded. Therefore, a technique of making a wiring pattern less visible by refractive index matching (Index Matching) has been proposed. For example, a technique of introducing a high refractive index thin film layer (IM layer) by sputtering or the like is known. On the other hand, there is also a need to form the IM layer with a transparent film using a relatively inexpensive and highly durable inorganic coating liquid material. [0003] In addition, in display elements such as touch panels, metal wiring and the like are usually covered by coating of a resin material....

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C09D183/04C08G77/08
CPCC08G77/08C09D183/04C09D5/024C09D7/63
Inventor 荒金宏忠江上美纪村口良平井俊晴小松通郎
Owner JGC CATALYSTS & CHEM LTD
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