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Calibration method and calibration device

A calibration method and technology of a calibration device are applied in the field of photolithography, which can solve problems such as inability to realize on-line testing, and achieve the effects of improving calibration efficiency, reducing calibration error and improving work efficiency.

Active Publication Date: 2017-03-15
TIANJIN JINXIN MICROELECTRONICS TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] In view of this, the purpose of the present invention is to provide a calibration method and a calibration device, which can realize the online test of the platform, so as to solve the problem that the laser interferometer in the prior art can only measure the deflection when the machine is not assembled, and cannot realize online test questions

Method used

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  • Calibration method and calibration device

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Experimental program
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Effect test

Embodiment 1

[0042] like figure 1 As shown, a calibration method provided by the present invention is used for online testing of the deflection of the XY-axis loading platform of a lithography machine. The calibration method includes:

[0043] S2: Place the calibration plate on the XY axis loading platform of the lithography machine;

[0044] Specifically, move the XY-axis loading platform of the lithography machine to a suitable position, lay the calibration plate flat and place it at the center of the XY-axis loading platform.

[0045] S4: Select graphic points A and B to be calibrated, and read the distance between A and B as d1;

[0046] Specifically, select two graphic points A and B located in the same row and at a certain distance from the graphic dot matrix of the calibration board, and you can directly read the test distance d1 between A and B, which is usually set to 200mm. The distance between the centers of adjacent graphic points in the array is 10mm, that is, d1 is usually ...

Embodiment 2

[0074] like image 3 and Figure 4 As shown, a calibration device provided by an embodiment of the present invention is used for on-line testing of the deflection of the XY-axis loading platform 4 of a lithography machine, and includes a calibration plate 3, a first camera 1 and a second camera 2, wherein,

[0075] The XY-axis loading platform 4 includes a two-dimensional degree of freedom in the horizontal direction, which can realize XY-axis linkage;

[0076] The first camera 1 is fixed above the XY-axis loading platform 4, the second camera 2 is placed at the same height as the first camera 1, and the Y-axis coordinates of the two are the same, and the second camera 2 can move along the X-axis direction;

[0077] The calibration device in this embodiment adopts the calibration method in Embodiment 1.

[0078] Further, the maximum stroke or displacement distance of the second camera 2 along the X axis is 300 mm.

[0079] Preferably, the XY-axis loading platform 4 includes...

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Abstract

The invention provides a calibration method and a calibration device. The calibration method and the calibration device are used for on-line test on deflection of an XY-axis object-carrying platform of a photoetching machine and belong to the technical field of photoetching. The calibration method disclosed by the invention comprises the steps of placing a calibration plate on the XY-axis object-carrying platform of the photoetching machine; selecting pattern points A and B which are needed to be calibrated, and reading a distance between the A and the B to be d1; moving the center of the pattern point A to be coincided with a central point of a first camera; slightly adjusting a second camera so that the pattern point B is arranged in a visual range of the second camera, and reading a distance between the two cameras to be d2 and a distance between a central point of the second camera and a calibration point to be d3; and calculating a deflection angle a of the calibration plate according to d1, d2 and d3. By the method, on-line test on deflection can be achieved, on-line test on deflection of the platform can be achieved, and the technical problem that the deflection cannot be measured after the whole machine of the platform of the photoetching machine is successfully assembled in the prior art is solved.

Description

technical field [0001] The invention belongs to the technical field of photolithography, and in particular relates to a calibration method and a calibration device. Background technique [0002] Photolithography is the technique used to print a pattern of features on the surface of a substrate. Such substrates can be used in the manufacture of semiconductor devices, various integrated circuits, flat panel displays (such as liquid crystal displays), circuit boards, biochips, micromechanical electronic chips, optoelectronic circuit chips, and the like. Since most of the printed circuit boards (PCB boards) on the market are precision circuits, in the lithography machine, the repeated positioning accuracy of the workpiece table movement is crucial to the exposure quality of the lithography machine. Domestic deflection is measured with laser interferometer or collimator. [0003] However, using a laser interferometer can only measure the deflection when the machine is not assem...

Claims

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Application Information

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IPC IPC(8): G03F7/20
CPCG03F7/7085
Inventor 史喆琼
Owner TIANJIN JINXIN MICROELECTRONICS TECH CO LTD