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Double parallel LED light source mechanism for exposure machine

A technology of LED light source and parallel light source, which is applied in the direction of optomechanical equipment, microlithography exposure equipment, photolithography exposure device, etc., can solve the problems of complex installation structure, high installation cost and high use cost, and achieve simple installation structure, The effect of reduced installation cost and convenient irradiation angle

Inactive Publication Date: 2017-03-22
DONGGUAN HAISHENG PHOTOELECTRICITY TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, this traditional light source setting method has a big disadvantage. First, the energy of a single light source itself is not very sufficient. After the transition of the plane light mirror, the energy will be attenuated, and after reflection and refraction, a long distance is required. The energy will attenuate again, so that the light energy that finally reaches the exposure position will be significantly reduced, resulting in low exposure efficiency, and it will take a long time to complete an exposure. For example, the exposure time to complete a frame is generally more than 15 seconds; Secondly, the use of mercury lamps will not only cause serious pollution problems, but also the mercury lamp itself is extremely power-hungry. A light source is emitted, and the propagation route of the light will be changed after passing through the plane light mirror. Therefore, the traditional method must set up a rather complicated adjustment mechanism to adjust the position of the light source to achieve a more accurate irradiation position, resulting in a comparison of the installation structure. Complicated, high installation cost, complex adjustment operation

Method used

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  • Double parallel LED light source mechanism for exposure machine

Examples

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Embodiment Construction

[0012] In this example, refer to figure 1 , the double LED parallel light source mechanism for the exposure machine includes two reflectors, i.e. the first reflector 6 and the second reflector 7, and the two reflectors are arranged on both sides of the exposure table 9 and are inclined towards the exposure table 9 settings; the light source adopts LED light sources, including two groups of LED light sources, that is, the first LED light source module 4 and the second LED light source module 5, wherein the first LED light source module 4 faces the first reflector 6, and the emitted The light is directly irradiated to the first reflector 6 and is reflected by the first reflector 6 and is irradiated to the exposure table 9 as parallel light; the second LED light source module 5 faces the second reflector 7, and the light emitted by it is directly irradiated to the second reflector 7. The reflector 7 is reflected by the second reflector 7 and irradiates the exposure table 9 as par...

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Abstract

The invention discloses a double parallel LED light source mechanism for an exposure machine. The double parallel LED light source mechanism comprises a first reflector and a second reflector, wherein LED light sources are adopted by a light source; the light source comprises two groups of LED light sources, namely a first LED light source module and a second LED light source module; the first LED light source module is toward the first reflector; and the second LED light source module is toward the second reflector. Through the adoption of two groups of LED light sources, the two groups of light sources are arranged at the positions closer to the reflectors for directly irradiating the reflectors and a middle transition plane light mirror is omitted, so that the illumination intensity can be improved by over twice, the exposure efficiency can be improved by over three times, and if the exposure time for completing a same frame circuit board is only 5 seconds, the weekly power consumption is only more than 200 kilowatt-hours and is reduced by over 75%. Furthermore, an installation structure of the whole equipment is extremely simple, the installation cost is reduced by about 50% and adjustment of the irradiation angles is also greatly facilitated.

Description

technical field [0001] The invention relates to the technical field of a light source mechanism of an exposure machine, in particular to a light source mechanism for surface exposure of a circuit board (PCB / FPC, etc.). Background technique [0002] With the development of electronic technology, the application of circuit boards (PCB / FPC, etc.) is becoming more and more extensive, and the technical requirements for its processing and manufacturing are getting higher and higher. The surface ink exposure of the circuit board is an important process in the circuit board manufacturing process, which determines the final quality of the circuit board. The light source mechanisms of traditional exposure machines basically use mercury lamps as the light source, and they all use a single light source. The light source is adjusted by a certain adjustment mechanism, such as a fly-eye lens, etc., and then passes through a transitional plane light mirror. After passing through the plane ...

Claims

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Application Information

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IPC IPC(8): G03F7/20
CPCG03F7/2004G03F7/2008G03F7/70008G03F7/70233
Inventor 袁强刘长征
Owner DONGGUAN HAISHENG PHOTOELECTRICITY TECH
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