Double parallel LED light source mechanism for exposure machine

The invention discloses a double parallel LED light source mechanism for an exposure machine. The double parallel LED light source mechanism comprises a first reflector and a second reflector, wherein LED light sources are adopted by a light source; the light source comprises two groups of LED light sources, namely a first LED light source module and a second LED light source module; the first LED light source module is toward the first reflector; and the second LED light source module is toward the second reflector. Through the adoption of two groups of LED light sources, the two groups of light sources are arranged at the positions closer to the reflectors for directly irradiating the reflectors and a middle transition plane light mirror is omitted, so that the illumination intensity can be improved by over twice, the exposure efficiency can be improved by over three times, and if the exposure time for completing a same frame circuit board is only 5 seconds, the weekly power consumption is only more than 200 kilowatt-hours and is reduced by over 75%. Furthermore, an installation structure of the whole equipment is extremely simple, the installation cost is reduced by about 50% and adjustment of the irradiation angles is also greatly facilitated.