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Inclined silicon needle point and its manufacturing method

A production method and inclined technology, which is applied in the field of micro-nano device preparation, can solve the problems that cannot meet the needs of near-field optical real-time observation, and achieve the effect of being suitable for large-scale production, simple production method, and cheap and easy-to-obtain raw materials

Active Publication Date: 2019-04-23
SUZHOU INST OF NANO TECH & NANO BIONICS CHINESE ACEDEMY OF SCI
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The silicon needle tips prepared by the above existing processes are basically vertical needle tips, which cannot meet the needs of near-field optics for real-time observation

Method used

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  • Inclined silicon needle point and its manufacturing method
  • Inclined silicon needle point and its manufacturing method
  • Inclined silicon needle point and its manufacturing method

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Embodiment Construction

[0027] As mentioned above, in view of the deficiencies in the prior art, the inventor of this case proposed the technical solution of the present invention after long-term research and a lot of practice, and obtained unexpectedly good technical effects. The technical solutions of the present invention will be described in more detail below in conjunction with the embodiments and the accompanying drawings.

[0028] see Figure 1-2 , which shows a typical implementation case of the present invention.

[0029] Further, see figure 1 , this embodiment relates to an inclined silicon needle tip, which is a triangular pyramid and has a first inclined surface, a second inclined surface, a third inclined surface and a bottom surface, and the first inclined surface, the second inclined surface and the Angles between at least two of the third inclined surfaces and the bottom surface are not equal.

[0030] Wherein, the included angle between the first inclined surface and the bottom su...

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Abstract

The invention discloses an inclined silicon needle point and a manufacturing method thereof. The needle tip is a triangular pyramid and has a first inclined surface, a second inclined surface, a third inclined surface and a bottom surface, and at least two of the first inclined surface, the second inclined surface and the third inclined surface are connected to the bottom surface angles are not equal. The manufacturing method comprises: using an isotropic etching process to process and form the first and second inclined surfaces of the inclined silicon needle tip on the silicon wafer, then setting a protective layer on the first and second inclined surfaces, and then The etching process is used to process and form the third inclined surface on the silicon wafer, so as to obtain the target product. The invention provides an inclined silicon needle tip different from the traditional silicon needle tip, which can meet the demand of near-field optics for real-time observation, and has a simple manufacturing method, cheap and easy-to-obtain raw materials, and is suitable for large-scale production. The promotion and application of it provides a new path.

Description

technical field [0001] The invention mainly relates to a silicon needle point, in particular to an inclined silicon needle point and a manufacturing method thereof, belonging to the field of preparation of micro-nano devices. Background technique [0002] In recent years, silicon-based nano-tips have been widely used in atomic force microscope probes, vacuum microelectronic devices, field emission devices, high-density data storage devices, nanoscale pattern processing, and micromechanical tunnel sensors. Silicon-based nano-tips are the key to these devices. Key building blocks, the performance of these devices depends on the radius of curvature and needle shape of the nanoneedle tip. Taking the atomic force microscope as an example, the larger the aspect ratio of the silicon tip, the smaller the radius of curvature, and the higher the resolution of the atomic force microscope. Therefore, it is of great significance to study the fabrication of silicon-based nano-tips. At pr...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G01Q70/16
CPCG01Q70/16
Inventor 李加东苗斌吴东岷
Owner SUZHOU INST OF NANO TECH & NANO BIONICS CHINESE ACEDEMY OF SCI
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