The invention relates to a
negative refraction artificial material based on a
metal covering layer, which comprises the following steps that (1) a
quartz basal piece is selected, the surface of the
quartz basal piece is polished, and then, a high-purity SiO2 film is evaporated and plated on the surface of the
quartz basal piece; (2) the surface of a high-purity SiO2 film is evaporated and plated with a chrome film, and a layer of
photoresist is evenly coated on the high-purity SiO2 film; (3) an
electron beam photoetching method is adopted, and a medium
grating structure is prepared on the
photoresist; (4) a wet
etching technology is adopted, the
photoresist is used as a
mask, and the exposed chrome film is etched; (5) a
dry etching technology is adopted, the chrome film is used as the
mask, the medium
grating structure is etched on the high-purity SiO2 film, and the chrome film is removed; (6) a
vacuum evaporation technology is adopted, a
metal layer is evaporated and plated on the SiO2
grating structure, the thickness of the
metal layer is h, and the
negative refraction artificial material based on the metal covering layer is completely prepared. The invention has the advantages of convenient preparation, little single-layer consumption and
signal-layer normal incidence and has a wide application prospect in the fields of magnetic
resonance,
near field optics, stealth materials, and the like.