High precision nanometer clearance detection structure and method on basis of surface plasma resonance

Abstract

The invention provides a high precision nanometer clearance detection structure and method on the basis of surface plasma resonance, and belongs to the technical field of nanooptics. The high precision nanometer clearance detection structure and method on the basis of the surface plasma resonance can solve the problems that measuring precision is low and dynamic measurement cannot be carried out in the prior art. Light output by a light source enters a beam splitter through a collimating mirror and a broadband polarizer; the transmission light passing through the beam splitter interacts with the nanometer clearance detection structure and a substrate and then is reflected to the beam splitter; the light enters a spectrum detector after being reflected by the beam splitter and converged by a lens, the detector transmits obtained data through detection to a computer, clearance values are obtained through the processing of the computer, and the detection of the nanometer clearance is achieved. According to the high precision nanometer clearance detection structure and method on the basis of the surface plasma resonance, the method of spectrum detection is adopted to achieve high precision dynamic detection of a nanometer level clearance, a brand new testing technology is provided for the field of nanometer machining and nanometer measuring, and hopefully, the high precision nanometer clearance detection structure and method on the basis of the surface plasma resonance can play an important role in multiple fields including near-field optics and near-field physics.

Description

technical field [0001] The invention relates to the manufacture of a high-precision nano-gap detection structure based on surface plasmon resonance and the control of light waves, which can realize high-precision dynamic detection of nano-level gaps. Background technique [0002] The sensing and detection of nanoscale gap width is widely used in the fields of semiconductor manufacturing, high-density magnetic storage, and roughness detection of ultra-smooth surfaces. Especially in the field of near-field lithography, such as surface plasmon nano-lithography, scanning probe lithography, proximity X-ray lithography and other new nano-processing fields, in order to achieve high resolution and high processing accuracy, the device and substrate The pitch is usually required to be on the order of sub-micron or even tens of nanometers, and the gap accuracy needs to be controlled in the range of several nanometers to tens of nanometers. In order for the system to achieve such a high...

AI Technical Summary

Problems solved by technology

[0005] The technical problem to be solved by the present invention is: Aiming at problems such as the low measurement accuracy of traditional gap detection technology and the difficulty in realizing the absolute measurement of nanometer-level gaps, a method based on the principle of surface plasmon resonance that can realize high-precision dynamic detection of nano-gap structure and method

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