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Selective micro processing method and system for near field optic virtual light probe

A near-field optics and virtual light technology, which is applied in the fields of near-field optics and laser micromachining, can solve problems such as difficult spacing control, weak selectivity, and complex systems, and achieves easy system construction, high light transmission efficiency, and optical components. little effect

Inactive Publication Date: 2007-01-24
JIANGSU UNIV
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  • Abstract
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AI Technical Summary

Problems solved by technology

[0006] The purpose of the present invention is to overcome the shortcomings of traditional micromachining such as complex system, difficult spacing control, and poor selectivity, and to use near-field optical virtual light probes with excellent characteristics to realize selective micromachining of material surfaces

Method used

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  • Selective micro processing method and system for near field optic virtual light probe
  • Selective micro processing method and system for near field optic virtual light probe
  • Selective micro processing method and system for near field optic virtual light probe

Examples

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Embodiment Construction

[0015] to combine figure 1 The schematic diagram of the near-field optical virtual light probe selective micromachining system of the example is described as follows for the details and implementation of the specific device of the present invention:

[0016] The basic device for selective micromachining of near-field optical virtual optical probes is composed of a laser 1, an external optical system, and a micromachining system. Composed of polarizer 3, optical retarder 5, and mirror 6; the micromachining system includes near-field optical virtual light probe formation and adjustment system, processing material control system, and the main components include triangular prism 4, metal film layer 7, micro-movement Stage 9 and processing material 10.

[0017] The core part of the system proposed by the present invention is a near-field optical virtual light probe forming and adjusting system. In order to generate the evanescent wave field at the interface between the triangular...

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Abstract

The present invention is selective micro machining method and system for different materials with near field optical virtual light probe. The present invention proposes selective micro machining with near field optical virtual light probe in nanometer size and provides one designed micro machining system. After the laser beam the laser emits after passing through the light filter and the polarizer is incidenced to the triangular prism, the refracted laser beam may be total internally reflected and the reflected laser beam out of the other side of the triangular prism is made to pass through the optical delayer and reflected by the reflector to the bottom of the triangular prism along the original path to form the virtual light probe. The material to be machined is set in certain distance below the bottom of the triangular prism for micro machining with the virtual light probe while being micro shifted with some miniature stage. The present invention has raised micro machining precision.

Description

technical field [0001] The invention belongs to the technical fields of near-field optics and laser micromachining, and particularly proposes a method and system for selective micromachining of various materials using near-field optics virtual light probes. Background technique [0002] Traditional laser micromachining mainly includes holographic recording method, laser direct scanning method, and optical fiber probe operation method. The experimental device of the holographic recording method is complicated, the equipment is expensive, and the interference of the beam is difficult to adjust, which limits its application in the field of microfabrication. The resolution of the laser direct scanning method is low, and the processing process is difficult to control. Due to the low light transmission efficiency of the fiber optic probe, and the distance between the fiber probe and the processing surface must be controlled in the near-field region (about 10-50nm), it is difficul...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B23K26/00B23K26/36G02B17/08G02B27/10
Inventor 周明李保家蔡兰
Owner JIANGSU UNIV
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