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Irradiation-proof glass cover plate film with atomic oxygen protection performance, and preparation method thereof

A glass cover plate and radiation-resistant technology, which is applied in the field of radiation-resistant glass cover film and its preparation, can solve the problems of solar cell output power decline, increase adhesion and firmness, improve chemical stability, and improve The effect of work efficiency

Active Publication Date: 2017-05-10
CHINA ELECTRONIC TECH GRP CORP NO 18 RES INST +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The purpose of the present invention is to provide an anti-radiation glass cover film with atomic oxygen protection and a preparation method thereof, to solve the problem of MgF on the surface of the anti-radiation glass cover. 2 The thin film is oxidized and denatured by atomic oxygen in the low earth orbit region, which reduces the output power of solar cells

Method used

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  • Irradiation-proof glass cover plate film with atomic oxygen protection performance, and preparation method thereof
  • Irradiation-proof glass cover plate film with atomic oxygen protection performance, and preparation method thereof
  • Irradiation-proof glass cover plate film with atomic oxygen protection performance, and preparation method thereof

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Embodiment Construction

[0021] Embodiments of the present invention are further described below:

[0022] In order to prepare a surface film with a good anti-reflection effect, the design of the surface film in the present invention adopts the design of a multi-layer interference medium film. which includes HfO 2 film and SiO 2 Two types of film layers, HfO 2 The refractive index of the film layer is controlled at 1.93±0.02, SiO 2 The refractive index of the film layer is controlled at 1.45±0.01, HfO 2 film and SiO 2 There are 18 layers in total, and the materials and thicknesses are as follows:

[0023]

[0024] The optimal choice of film material and thickness is:

[0025] film layer 1 2 3 4 5 6 7 8 9 Material HfO 2

SiO 2

HfO 2

SiO 2

HfO 2

SiO 2

HfO 2

SiO 2

HfO 2

Thickness (nm) 10 66 15 72 22 63 30 50 43 film layer 10 11 12 13 14 15 16 17 18 Material SiO 2

HfO 2

SiO ...

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Abstract

The invention provides an irradiation-proof glass cover plate film with atomic oxygen protection performance, and a preparation method thereof. The irradiation-proof glass cover plate film comprises 18 layers including HfO2 film layers and SiO2 film layers; the refractive ratio of the HfO2 film layers is 1.93+-0.02; and the refractive ratio of the SiO2 film layers is 1.45+-0.01. According to the preparation method, HfO2 and SiO2 are taken as the surface film materials of the irradiation-proof glass cover plate film, so that denaturation caused by oxidation with atomic oxygen with high activity is not caused, surface film chemical stability is increased, the transmittivity of cover plates obtained via film coating is equal to that of MgF2, and it is beneficial for increasing of working efficiency of solar cell modules.

Description

technical field [0001] The invention belongs to the field of optical films, in particular to an anti-irradiation glass cover film with atomic oxygen protection and a preparation method thereof. Background technique [0002] Solar cells will be irradiated and bombarded by high-energy rays and charged particles in space, so a radiation-resistant glass cover sheet for space is often pasted on the surface of the solar cell. When sunlight is vertically irradiated on the surface of the cover glass, there is about 4% light reflection loss. In order to reduce light loss, MgF with an optical thickness of 1 / 4 wavelength is often deposited on the surface of the cover glass. 2 Thin film, in theory, can reduce the surface reflectance when sunlight is vertically incident, and improve the conversion efficiency of solar cell modules. [0003] However, in the low earth orbit region, the environmental components contain a large amount of atomic oxygen, accounting for about 80%, with high act...

Claims

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Application Information

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IPC IPC(8): C03C17/34
Inventor 孙希鹏杜永超肖志斌李晓东
Owner CHINA ELECTRONIC TECH GRP CORP NO 18 RES INST