A kind of light diffraction device and its preparation method and three-dimensional display device
A technology of light diffraction and manufacturing method, which is applied in the direction of exposure devices, optical elements, and optomechanical equipment in the photolithography process, and can solve the problem of limiting the resolution, contrast and field angle of structured light images, and making it difficult to fully demonstrate the advantages of diffractive structured light and other issues to achieve the effect of low cost, high contrast and high resolution
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[0041] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without creative efforts fall within the protection scope of the present invention.
[0042] A method for manufacturing a light diffraction device, comprising the steps of:
[0043] s1, use the fast Fourier transform algorithm of laser diffraction (or other Fourier transform algorithms) to calculate the second-order spectrum bitmap of random speckle; as figure 1 with figure 2 shown.
[0044] s2, processing the second-order spectral bitmap topography features onto the surface of the transparent substrate to form a phase-type diffractive optical el...
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