Light-operated IGBT realization method and structure based on tunneling effect
A technology of tunneling effect and realization method, which is applied in the direction of sustainable manufacturing/processing, electrical components, climate sustainability, etc., can solve the problems of IGBT insulation isolation and long state transition time, and achieve short photoelectric effect response time and formation The effect of short time, shortened state transition time and delay time
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[0034] All features disclosed in this specification, or steps in all methods or processes disclosed, may be combined in any manner, except for mutually exclusive features and / or steps.
[0035] Any feature disclosed in this specification, unless specifically stated, can be replaced by other alternative features that are equivalent or have similar purposes. That is, unless expressly stated otherwise, each feature is one example only of a series of equivalent or similar features.
[0036] Relevant description of the present invention:
[0037] 1. The low resistivity silicon layer refers to the resistivity lower than 10 4 ohm / cm layered structure of silicon.
[0038] 2. The P region below the gate region refers to figure 2 Below the middle grid, N - District and N + the area between the districts.
[0039] 3. The gate blocking potential is 5-15V lower than the source potential.
[0040] Design process: The typical structure of the IGBT in the prior art is as follows figu...
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