Hard coating and die
A technology of hard film and mold, applied in the direction of forming tools, manufacturing tools, coating of superimposed layers, etc., can solve the problem of insufficient effect, etc., and achieve the effect of excellent wear resistance
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Embodiment approach 1
[0046] [mold]
[0047] First, refer to figure 1 , the structure of the mold 1 according to Embodiment 1 of the present invention will be described. The die 1 is a press die for forming a metal plate 10 (formed member), and has an upper die (first die) 1A and a lower die (second die) 1B. The metal plate 10 is a steel plate, an aluminum (Al) plate, or the like, and a metal layer 10A containing Al or zinc (Zn) is formed on the surface thereof. The metal layer 10A is formed by methods such as plating, and is composed of single metals such as Al and Zn or alloy metals such as Al—Si, Zn—Al, Zn—Mg, and Zn—Fe. In addition, it is not necessary to form the metal layer 10A on the metal plate 10 . In addition, mold 1 is not limited to figure 1 The bending die shown above can also be applied to other stamping dies such as punching dies, drawing dies, or press dies.
[0048] like figure 1 Shown, upper mold 1A and lower mold 1B, along the up-down direction ( figure 1 middle arrow) are...
Embodiment approach 2
[0072] Next, for the hard film 15 according to Embodiment 2 of the present invention, refer to Figure 4 Be explained. The hard film 15 of the second embodiment contains the elements of Cr, M, and C similarly to the hard film 12 of the first embodiment, and the atomic ratio of C is adjusted to be 0.03 or more and 0.5 or less, but the difference is that A multilayer film in which first film layers 13 and second film layers 14 having different compositions are laminated alternately.
[0073] First, the film composition and film structure of the hard film 15 according to Embodiment 2 will be described. The first film layer 13, its composition formula is Cr 1－e－f－g m e C f N g . In this composition formula, e is the atomic ratio of element M, f is the atomic ratio of C, and g is the atomic ratio of N. In addition, since the total of the atomic ratios of all elements is 1, the atomic ratio of Cr is represented by 1-e-f-g.
[0074] In the first film layer 13, the element M i...
Embodiment 1
[0089] First, use image 3The film forming apparatus 2 shown produced a hard film having an atomic ratio of No. 4 in Table 1 below in the following procedure. First, a ball (10 mm in diameter) of JIS standard SKD11 (Rockwell hardness (HRC) 60) was prepared as a base material for a sliding test for evaluating the wear resistance of the film, and was set on the mounting table 24 in the chamber 21 . In addition, a CrW target having an atomic ratio of No. 4 in Table 1 below was installed on the AIP evaporation source 22A.
[0090] Secondly, depressurize the chamber 21 to 1×10 －3 Pa or so. Next, Ar gas was introduced into the chamber 21 to heat the substrate to 450° C., and then the surface of the substrate was etched (cleaned) for 5 minutes with Ar ions.
[0091] Next, Ar and methane gases were introduced until the pressure in the chamber 21 reached 2.7 Pa. Then, arc discharge was started by flowing an arc current of 150 A, and a voltage of 50 V was applied to the substrate to...
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Abstract
Description
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