Novel plane magnetron sputtering cathode with high target material utilization rate
A magnetron sputtering and cathode technology, applied in the field of magnetron sputtering, can solve the problems of high cost, formation of pollution, insufficient application surface of high-speed rotating magnet, etc., and achieve the effect of improving utilization rate and maintaining stability
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[0063] In order to better understand and illustrate the present invention, the present invention will be further described in detail below in conjunction with the accompanying drawings.
[0064] The invention provides a planar magnetron sputtering cathode. Please refer to Figure 9 , Figure 9 It is a structural cross-sectional schematic view of a specific embodiment of the planar magnetron sputtering cathode according to the present invention. Such as Figure 9 As shown, the planar magnetron sputtering cathode includes a target 100, a back plate 400, a magnet device and a magnetically conductive plate 300, the target 100 is arranged on one side of the back plate 400, and the magnetically conductive plate 300 is set On the other side of the back plate 400, the magnet device is arranged between the back plate 400 and the magnetic conductive plate 300, wherein:
[0065] The magnet arrangement comprises a central magnet 220 and an outer magnet 210 surrounding the central magn...
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