Magnetron sputtering device and method for silver plating of inner wall of reduction cover used for polycrystalline silicon production
A magnetron sputtering device and polysilicon technology, applied in sputtering coating, ion implantation coating, vacuum evaporation coating, etc., can solve the problems of high cost and low bonding strength of silver layer, and achieve low cost and good effect , The effect of reducing power consumption
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[0021] In order to allow those skilled in the art to understand the present invention more clearly and intuitively, the present invention will be further described below in conjunction with the accompanying drawings.
[0022] like Figure 1-2 Shown is a preferred embodiment of the invention.
[0023] A magnetron sputtering device for silver-plating the inner wall of a reduction cover for polysilicon production, including a reduction cover base 1, a vacuum pump group 2, a rotating frame 3, a cathode assembly and a rotary drive mechanism (not shown in the figure), and a reduction cover base 1 The restoration cover 6 used to place the undercut forms a closed space. A rotating frame 3 is arranged above the restoration cover base 1. The rotating frame 3 includes a side frame 31 and a top frame 32. The lower end of the rotating frame 3 is driven to rotate by a rotating drive mechanism to rotate. The rotary shaft 5 of the driving mechanism is sealed with the reduction cover base 1, ...
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Abstract
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