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Method for manufacturing array substrate, array substrate and display device

A manufacturing method and an array substrate technology, applied in the field of array substrates and display devices, array substrate manufacturing methods, capable of solving the problems of complex manufacturing process, high price, unfavorable mass production, etc.

Active Publication Date: 2021-01-26
BOE TECH GRP CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] However, for the above semi-transparent mask patterning method, the price of the semi-transparent mask plate 01 used is relatively expensive, and the manufacturing process is relatively complicated, so that the manufacturing cost of the OLED display device is still relatively high, which is not conducive to mass production.

Method used

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  • Method for manufacturing array substrate, array substrate and display device
  • Method for manufacturing array substrate, array substrate and display device
  • Method for manufacturing array substrate, array substrate and display device

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Embodiment Construction

[0034] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.

[0035] An embodiment of the present invention provides a method for manufacturing an array substrate, such as figure 2 As shown, the production method includes:

[0036] Step S101, such as image 3 As shown, a first photoresist layer 101 and a second photoresist layer 102 are sequentially formed on the substrate 10 , wherein the refractive index of the first photoresist layer 101 is smaller than that of the second photoresist layer 102 .

[0037] Specifical...

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PUM

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Abstract

Embodiments of the present invention provide a method for manufacturing an array substrate, an array substrate, and a display device, which relate to the technical field of display manufacturing, and can form two step-like film patterns by using a common mask and exposing once. array substrate. The manufacturing method of the array substrate comprises: sequentially forming a first photoresist layer and a second photoresist layer on the substrate, wherein the refractive index of the first photoresist layer is smaller than the refractive index of the second photoresist layer; Exposing the substrate formed with the first photoresist layer and the second photoresist layer with the incident light beam passing through the mask and having oblique rays at the edge; performing development processing on the exposed substrate to form steps Shaped developing pattern layer; curing treatment is performed on the developing patterned layer.

Description

technical field [0001] The invention relates to the technical field of display manufacturing, in particular to a method for manufacturing an array substrate, the array substrate and a display device. Background technique [0002] In the existing field of display manufacturing technology, especially for the manufacture of array substrates, it is generally necessary to go through two patterning processes (that is, using two ordinary masks) for the adjacent thin film layers to form the pattern respectively. Two film layer patterns are required; of course, in order to simplify the process and reduce the production cost, for some adjacent film layer patterns, you can choose to use the semi-transparent mask (Half Tone Mask) patterning method, by using the semi-transparent mask plate for two Adjacent thin film layers are exposed once to form two film layer patterns. [0003] Specifically, taking an array substrate in an organic light emitting diode (Organic Light Emitting Diode, O...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L21/027H01L21/84H01L51/56H01L27/12H01L27/32H01L51/00H10K99/00
CPCH01L27/1222H01L27/127H01L27/1288H01L21/0274H10K59/12H10K71/20
Inventor 陈善韬
Owner BOE TECH GRP CO LTD