Polishing agent for petroleum instruments

A polishing liquid and instrument technology, applied in the field of polishing liquid, can solve the problems of poor surface finish and deep damage layer, and achieve the effect of bright surface, good decontamination and good anti-rust function.

Inactive Publication Date: 2017-09-29
NANTONG HUAXING OIL EQUIP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In the previous polishing process, mechanical polishing was generally used. The mechanical polishing surface has high flatness, but the surface finish is poor and the damage layer is deep.

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0009] A polishing fluid for petroleum instruments, made of the following raw materials in parts by weight: 9 parts of sodium salicylate, 3 parts of methyl silicone oil, 2 parts of potassium dihydrogen phosphate, 6 parts of orthophosphoric acid, 2 parts of polyvinyl alcohol, molybdenum 1 part of sodium phosphate, 3 parts of ethylenediamine tetramethylene phosphonic acid, 3 parts of zinc sulfate, 2.4 parts of dispersant, 2 parts of citric acid, 2 parts of sodium tripolyphosphate, and 6 parts of silicon dioxide.

Embodiment 2

[0011] A polishing fluid for petroleum instruments, made of the following raw materials in parts by weight: 15 parts of sodium salicylate, 7 parts of methyl silicone oil, 6 parts of potassium dihydrogen phosphate, 10 parts of orthophosphoric acid, 4 parts of polyvinyl alcohol, molybdenum 3 parts of sodium phosphate, 8 parts of ethylenediamine tetramethylene phosphonic acid, 9 parts of zinc sulfate, 5.4 parts of dispersant, 4 parts of citric acid, 6 parts of sodium tripolyphosphate, and 12 parts of silicon dioxide.

Embodiment 3

[0013] A polishing fluid for petroleum instruments, made of the following raw materials in parts by weight: 12 parts of sodium salicylate, 5 parts of methyl silicone oil, 4 parts of potassium dihydrogen phosphate, 8 parts of orthophosphoric acid, 3 parts of polyvinyl alcohol, molybdenum 2 parts of sodium phosphate, 5.5 parts of ethylenediamine tetramethylene phosphonic acid, 6 parts of zinc sulfate, 3.9 parts of dispersant, 3 parts of citric acid, 4 parts of sodium tripolyphosphate, and 9 parts of silicon dioxide.

[0014] The polishing liquid of the invention can decontaminate the surface of parts well, make the surface bright and lustrous, and has good antirust function.

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PUM

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Abstract

The invention discloses a polishing agent for petroleum instruments. The polishing agent is characterized by being prepared from the following materials in parts by weight: 9 to 15 parts of sodium salicylate, 3 to 7 parts of methylsilicone oil, 2 to 6 parts of monopotassium phosphate, 6 to 10 parts of orthophosphoric acid, 2 to 4 parts of polyvinyl alcohol, 1 to 3 parts of sodium molybdate, 3 to 8 parts of ethylenediamine tetramethylenephosphonic acid, 3 to 9 parts of zinc sulfate, 2.4 to 5.4 parts of dispersant, 2 to 4 parts of citric acid, 2 to 6 parts of sodium tripolyphosphate and 6 to 12 parts of silicon dioxide. The polishing agent disclosed by the invention can effectively clean the surface of a part, so that the surface is bright and glossy, and moreover, the polishing agent has a good antirust function.

Description

technical field [0001] The invention relates to a polishing liquid for petroleum instruments. Background technique [0002] Polishing refers to the use of mechanical, chemical or electrochemical action to reduce the surface roughness of the workpiece to obtain a bright and smooth surface. It is a modification process on the surface of the workpiece by using flexible polishing tools and abrasive particles or other polishing media. In the previous polishing process, mechanical polishing was generally used. The mechanical polishing surface has high flatness, but the surface finish is poor and the damage layer is deep. It is not conducive to the precision of processing. Chemical polishing can obtain a more perfect surface and a higher polishing rate. Widely used in LED industry and semiconductor industry. Contents of the invention [0003] The purpose of the present invention is to address the deficiencies of the prior art, and now provides a polishing solution that can dec...

Claims

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Application Information

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IPC IPC(8): C09G1/16C09G1/18
CPCC09G1/16C09G1/18
Inventor 唐生荣
Owner NANTONG HUAXING OIL EQUIP
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