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Test method of crystal optical uniformity and detection device thereof

A technology of crystal optics and testing methods, which is applied to the measurement of phase-influenced characteristics and polarization-influenced characteristics. It can solve the problems of low qualified rate of finished products, waste of precision processing work, and reduced efficiency. It achieves simple methods, reduces detection costs, and The effect of easy operation

Pending Publication Date: 2017-10-03
济南快谱光电技术有限公司
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Problems solved by technology

[0002] The current detection method for the optical uniformity of crystals (including artificial crystals and natural crystals) is usually to use a laser interferometer to detect the optical uniformity of the crystal to be inspected after precision processing, that is, it can only be detected after the finished product
It is impossible to accurately judge whether the optical uniformity of the crystal is qualified before precision machining, resulting in a low pass rate of finished products, wasting precision machining work, increasing costs, and reducing efficiency

Method used

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  • Test method of crystal optical uniformity and detection device thereof

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Effect test

Embodiment 1

[0026] Embodiment 1, this embodiment provides the test method of crystal optical uniformity

[0027] This embodiment is tested based on the following principles. The incident light emitted by a collimated linearly polarized coherent light source is incident on the crystal to be tested through detection polishing. By adjusting the polarization direction of the light source and the crystal axis (perpendicular to the incident light The axis of the crystal axis) position relationship, through the analysis of polarized interference imaging in the direction of the crystal axis of the crystal to be measured, can characterize the crystal optical uniformity (refractive index uniformity) in the direction of the crystal axis. The test method of the optical uniformity of the crystal provided in the embodiment.

[0028] First, use a device that can emit coherent light, such as a laser or a monochromator, to collimate and polarize the coherent light source emitted by the laser or a monochro...

Embodiment 2

[0032] Embodiment 2, this embodiment provides a detection device for the optical uniformity of the crystal prepared by the method provided in Embodiment 1.

[0033] As shown in Figure 1, the detection device for crystal optical uniformity provided in this embodiment includes a coherent light source emitter 1, a collimator 2, a polarizer 4, a phase retarder 5, a crystal placement table 6, As the analyzer 7 and the imaging receiving device 8 are common optical instruments, in this embodiment, only their function in detecting the optical uniformity of the blank crystal will be described.

[0034] The coherent light source transmitter 1 is used to emit a light source. More specifically, the coherent light source transmitter is a device capable of emitting coherent light such as a laser or a monochromator device. The main reason for using the coherent light source transmitter is that the coherent light source can be used to obtain clear Accurate polarization interference image, mor...

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Abstract

The invention relates to a test method of crystal optical uniformity and a detection device thereof. The method comprises the following effective steps of a, performing collimation and polarizing treatment on a selected coherent light source to obtain a detection light source required for detection; b, emitting incident light sent by the detection light source onto a crystal to be tested subjected to detective polishing treatment; regulating the position relationship of the incident light polarization direction and the crystal axial direction so that the crystal axial direction is vertical to the axial direction of the incident light; c, performing polarization inspection on the path of the incident light passing through the crystal to be tested to realize the polarization interference imaging; d, performing receiving display on the polarization interference imaging subjected to polarization inspection for further obtaining the crystal optical refractive index of the crystal in the crystal axial direction. The polarization interference imaging principle of the crystal in different axial directions is utilized; through the analysis and the comparison, the blank of a crystal device is subjected to primary inspection; inspected products with the qualified optical uniformity directly enter the precise processing work procedure; the occurrence of rejection products with unqualified optical uniformity in finished products is avoided.

Description

technical field [0001] The invention belongs to the technical field of crystal optical uniformity detection, in particular to a method for testing crystal optical uniformity and a detection device thereof. Background technique [0002] The current detection method for the optical uniformity of crystals (including artificial crystals and natural crystals) is usually to use a laser interferometer to detect the optical uniformity of the crystal to be inspected after precision processing, that is, it can only be detected after the finished product. It is impossible to accurately determine whether the optical uniformity of the crystal is qualified before precision machining, resulting in a low pass rate of finished products, wasting precision machining work, increasing costs, and reducing efficiency. Therefore, there is an urgent need for a method that can detect the optical uniformity of the crystal before the unfinished product, so as to improve the qualified rate of the finish...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01N21/21G01N21/45
CPCG01N21/21G01N21/45
Inventor 井旭
Owner 济南快谱光电技术有限公司
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