Array substrate and manufacturing method thereof
An array substrate and manufacturing method technology, applied in the field of touch screens, can solve the problems of high manufacturing cost, complex process flow, and restrictions on extensive development, and achieve the effects of improving the yield rate, simplifying the manufacturing process, and reducing costs
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[0029] Embodiment: an array substrate, the specific manufacturing process is as follows:
[0030] Step 1: As shown in Figure 1(a), on the substrate Glass 1, the gate line Gate 2 metal layer is formed on the substrate Glass 1 by means of film formation, exposure, development, and etching, and is connected to the gate line Gate 2 The grid, the first metal wire is a single-layer film of aluminum, molybdenum, copper, titanium, chromium, neodymium or a composite film of any combination thereof.
[0031] Step 2: As shown in FIG. 1(b), form a thin film of the gate insulating layer GI 3 on the metal layer of the gate line Gate 2. The material can be a single body of silicon oxide or silicon nitride, or a combination of both, Approx. The pattern of oxide semiconductor OS 4 is formed on the gate insulating layer GI3 by means of film formation, exposure, development, and etching. The semiconductor is not limited to InGaZnO, but can also be completed by other oxide semiconductor materia...
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