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Magnetically assisted electron impact ion source for mass spectrometry

A technology for electron bombardment of ions and mass analyzers, applied in the direction of electron/ion optical devices, ion sources/guns, mass spectrometers, etc., can solve problems such as limited application range, high cooling requirements, and space charge problems

Active Publication Date: 2017-10-27
BRUKER SCI LLC
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  • Abstract
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  • Claims
  • Application Information

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Problems solved by technology

One disadvantage of this configuration, however, is that the solenoid requires a high current to generate the required strength of the magnetic field, which requires high cooling and limits the use of this source to large, high-power instruments
Another disadvantage is the creation of a "magnetic trap" in the path of the jet of air inside the solenoid magnet where large numbers of electrons can build up over time, eventually leading to space charge problems

Method used

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  • Magnetically assisted electron impact ion source for mass spectrometry
  • Magnetically assisted electron impact ion source for mass spectrometry
  • Magnetically assisted electron impact ion source for mass spectrometry

Examples

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Embodiment Construction

[0036] While the invention has been shown and described with reference to a number of different embodiments thereof, those skilled in the art will recognize that it can be modified in the form of and various changes in details.

[0037] Figure 4 A first embodiment of a magnetically assisted electron bombardment ion source for mass spectrometry according to the principles of the present invention is schematically shown. The source basically consists of two adjacent vacuum stages V1 and V2, each vacuum stage being evacuated down to the desired pressure by vacuum pumps denoted P1 and P2. For example, the suitable working pressure in V1 can be ≤10 -1 Pascal, while the suitable working pressure in V2 can be ≤10 -3 Pascal. The different pressure states are separated by a partition wall (1) with a small opening (2) in the center. A gas nozzle N serving as an injector is located in the first vacuum stage V1 with the nozzle tip pointing towards the opening (2) of the partition wal...

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Abstract

The invention relates to a mass spectrometer having an electron impact ionization source which comprises an ejector for forming a beam of sample gas being driven in a first direction through an interaction region; a magnet assembly configured and arranged such that its magnetic field lines pass through the interaction region substantially parallel to the first direction; an electron emitter assembly for directing electrons toward the interaction region in a second direction being aligned substantially opposite to the first direction, wherein the electrons propagate along and are confined about the magnetic field lines until reaching the interaction region and forming sample gas ions therein; and a mass analyzer located downstream from the interaction region to which the sample gas ions are guided for mass analysis.

Description

technical field [0001] The present invention relates to electron bombardment ion sources for use in mass spectrometers, particularly benchtop mass spectrometers such as gas chromatography / mass spectrometers (GCMS). Background technique [0002] Typically, gas chromatography / mass spectrometer instruments use an electron impact (EI) source to generate ions. In the most common prior art technique (see Figure 1), the sample is vaporized in a gas chromatograph (GC) and introduced into a source where the sample molecules flow from the end of the GC column (41) and bounce off the inner walls of the ionization chamber (40) to create transient local pressures before they diffuse through the source opening and are drawn away. The EI source uses a filament assembly (42) with a straight filament that produces electrons that are accelerated to typically seventy electron volts toward an ionization region where the electrons collide with sample molecules and ionize. Electrons can be guid...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01J49/06H01J49/14H01J49/20
CPCH01J49/06H01J49/147H01J49/20H01J49/34
Inventor 费利奇坎·蒙泰安
Owner BRUKER SCI LLC
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