Evaporating device and evaporating method
A technology of evaporation and evaporation source, applied in vacuum evaporation plating, sputtering plating, ion implantation plating, etc., can solve the problems of large range of plating rate jump, unstable plating rate monitoring, false plating rate, etc. The effect of achieving a stable evaporation rate
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[0044] In order to further illustrate the technical means adopted by the present invention and its effects, the following describes in detail in conjunction with preferred embodiments of the present invention and accompanying drawings.
[0045] see Figure 2 to Figure 4 , the present invention firstly provides an evaporation device, comprising: a chamber body 10, an evaporation source 20 disposed in the chamber body 10, a waiting device disposed in the chamber body 10 and above the evaporation source 20 a coating substrate 30, and a coating rate monitoring device 40 disposed in the cavity 10 and above the evaporation source 20;
[0046] Described plating rate monitoring device 40 comprises crystal oscillator plate 41; Described crystal oscillator plate 41 is the probe of described plating rate monitoring device 40, and described plating rate monitoring device 40 is deposited on crystal oscillator plate 41 by the vapor deposition of the material film layer The rate is monitore...
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