34results about How to "Evaporation rate is stable" patented technology

The invention provides a vacuum evaporation crucible which is obtained by machining a metal bar and removing materials. In the machining process of the metal bar, part of heat conducting structures capable of transferring heat to the middle of the crucible are reserved, for example, the contact area of a vacuum evaporation material and a crucible body is increased by increasing the inner surface area of the side wall of the crucible or additionally arranging heat conducting columns or heat conducting pieces and other heat conducting structures in the crucible, so that the vacuum evaporation material is evenly heated, the vacuum evaporation speed is constant, and the vacuum evaporation effect is improved.

The invention provides a crucible for sublimed OLED material vapor plating. The crucible comprise a body portion (1) and an upper cover portion (2) connected with the body portion (1), the center of the top of the upper cover portion (2) is provided with an air outlet (21), the internal surface of the body portion (1) has conicity, and the internal diameter of one side of the body portion (1) close to the upper cover portion (2) is greater than the internal diameter of one side of the body portion (1) far from the upper cover portion (2). The inner wall of the crucible is designed to have certain conicity, and the OLED material residual after the OLED material is sublimated settles under the action of gravity and continuously fully contacts with the inner wall of the crucible, so heating is full, and the stability of the vapor plating rate is guaranteed.

A crucible-type evaporator for the machine used to plate electroluminescent organic film is composed of supporting base, temp-measuring thermocuple system, crucible, and heating furnace which consists of upper and lower No.95 ceramic rings, cylindrical quartz glass as internal shielding layer, cylindrical stainless steel as external shielding layer, and Mo wire embedded in the inner surfaces of two ceramic rings. Its advantages are long service life, good temp control, stable evaporating speed, and high thermal insulating performance.

The present application discloses a vapor-deposition crucible comprising a crucible body for housing a vapor-deposition material and a heat conductor inside the crucible body. At least a portion of the heat conductor extends continuously from a region proximal to an interior surface of the crucible body to a region proximal to a center axis of the crucible body.

The invention discloses a three-dimensional integrated light-to-heat conversion material and a preparation method thereof. It prepares a foamed nickel graphene material by CVD on a pretreated foamed nickel substrate, and then prepares Ni-G-MoO3 by hydrothermal ‑x, the gas required for CVD is argon, high-purity hydrogen and high-purity methane; the performance parameters of the material are: thickness 0.5mm, evaporation rate under one light intensity is 1.50kg / m2h, efficiency is 95.8%, cycle stability More than 36h, hydrophilicity and hydrophobicity are superhydrophilicity. The invention combines graphene, molybdenum oxide and porous nickel foam through CVD and oxidation processes, which ensures that the material has a strong interfacial bonding force, and has super-hydrophilicity after one-step hydrothermal treatment, which can ensure the porous water absorption capacity of the material , At the same time, after the graphene covers the nickel foam surface, it can protect the application of the overall material in the marine environment and increase the service life of the material.

The invention provides an evaporation device and an evaporation method. The vapor deposition device of the present invention is provided with a crystal vibrating plate shielding plate between the evaporation source and the crystal vibrating plate, and the crystal vibrating plate shielding plate can be switched between the two positions of shielding the crystal vibrating plate and not shielding the crystal vibrating plate; When the position of the crystal oscillator is not blocked, the evaporation material is deposited on the crystal oscillator plate, thereby avoiding the evaporation material from being deposited on the crystal oscillator plate; when the crystal oscillator plate shielding plate is in a position that does not block the crystal oscillator plate, the evaporation material can be deposited on the crystal oscillator plate; the present invention When the evaporation device is applied to the evaporation process, in the initial stage of evaporation, that is, the evaporation stage of the surface impurities of the material to be evaporated, the crystal oscillator shielding plate is in the position of blocking the crystal oscillator to prevent impurities from depositing on the surface of the crystal oscillator; After the impurities on the surface of the evaporation material are evaporated, the shielding plate of the crystal oscillator is in a position not to block the crystal oscillator, the evaporation material is deposited on the surface of the crystal oscillator, and the deposition rate monitoring device obtains a stable evaporation rate.

The invention belongs to the technical field of Parylene F-type vapor deposition, and in particular relates to a Parylene F-type vapor deposition method; by optimizing and improving the evaporation process and the cracking process, the Parylene F-type raw material which is difficult to deposit can also obtain faster evaporation The film composition has excellent purity performance, and no changes have been made to the common Parylene vapor deposition equipment in China, which greatly improves the processing efficiency under the premise of ensuring the film performance. At the same time, due to the stable evaporation rate, the thickness of the final film layer can be controlled by controlling the process time, which reduces the difficulty of film thickness control and makes the reaction more controllable.

The invention relates to the technical field of semiconductor technology, in particular to an evaporation chamber lining device, an evaporation system, and an evaporation device. The evaporation chamber lining device provided by the present invention includes a chamber assembly, and the chamber assembly includes, a first shell having a first open end and a second open end oppositely arranged, and the first open end The evaporation device is externally connected, and a steam channel suitable for steam circulation is formed in the first housing; a second housing is communicated with the second open end, and a channel for retaining steam from the steam channel is formed in the second housing. Material storage area. The evaporation chamber lining device provided by the present invention can ensure that the evaporation device can raise the temperature of the organic material in advance, without worrying that the evaporated material will enter the evaporation area and cause interference to the substrate.

The present invention discloses a slow-release microcapsule for attracting beetles, and a preparation method and application thereof. The capsule comprises a wall material and a core material, wherein the wall material is made of 2-methyl-2-methyl acrylate, 2-methyl-2-methyl acrylate, 2-methyl-2-methyl acrylate, 2 ‑Methyl‑2‑acrylic acid and dibenzoyl peroxide; the core material is prepared from the beetle pheromone Conophthorin, n-hexane and paraffin, and the wall material and core material are emulsified with polyvinyl alcohol to obtain a sustained-release microbe. capsule. The capsules are installed in the trap to lure and kill the beetles, preventing or reducing their reproduction, so as to protect the host plants.

The invention provides a crucible for preventing evaporation materials from splashing and hole plugging, comprising a crucible body (1) for accommodating evaporation materials (2), and a cover body (3) covering the opening end of the crucible body (1) ); the lid (3) includes a loam cake (31), a lower lid (33) and a connecting portion (32) connecting the loam cake (31) and the lower lid (33); the loam cake (31) It is spaced apart from the lower cover (33) along the axial direction of the crucible body (1); several upper air outlets (313) are arranged in the upper opening area (311) of the upper cover (31), and the lower cover (33) Several lower air outlets (333) are arranged in the lower opening area (331), and the several upper air outlets (313) do not overlap with the several lower air outlets (333). The invention can improve the heat balance inside the large-diameter crucible and the balance between temperature and evaporation rate, solve the problems of unstable evaporation rate, easy blockage of air holes and material splashing during pre-melting, improve the stability of the evaporation process, and improve the evaporation rate. Plating equipment utilization rate.

An apparatus (100) for vaporizing a particulate material, including: a metering apparatus including: a reservoir (130) for receiving particulate material: the reservoir having an opening (160) for discharging the particulate material into a vaporizing chamber (210); a rotatable wire wheel brush (170) disposed in the reservoir; wherein the dimensions of the reservoir and the wire wheel brush are selected so that the wire wheel brush cooperates with the interior walls of the reservoir to fluidize the particulate material and wherein a metered portion of the particulate material is entrained in the tines of the wire wheel brush and subsequently forcefully released into the reservoir opening; and a flash evaporator (120) that receives and vaporizes the metered material.

A heating device and an evaporation device using the same are provided. The heating device includes a crucible, a heat conducting element and a heating element. The crucible includes a bottom surface, an opening opposite to the bottom surface and an accommodation space for accommodating a to-be-evaporated material. The heat conducting element is disposed in the accommodation space of the crucible and disposed on the bottom surface and extending towards the opening. The heating element is disposed adjacent to the crucible.

The invention discloses a circulating system for supplying a stable liquid source for ammonia volatilization. A prepared ammonia solution is placed in a water storage tank; one end of a regulating valve is connected with a circulating pump arranged in the water storage tank through a first hose, and the other end of the regulating valve is connected into a test tank through a second hose; and oneend of a third hose is connected into the water storage tank, the other end of the third hose is connected with the end of a right-angle copper pipe, which is parallel to the liquid level, and the end of the right-angle copper pipe, which is perpendicular to the liquid level, keeps consistent with the level of the ammonia solution. The volatilization speed of ammonia on the surface of the solution can keep stable; by using the circulating system, the characteristics such as pH value and total ammonia nitrogen concentration of the solution can keep roughly same within long time; the pH value of the solution can be regulated as required, and the operation is convenient. The circulating system provided by the invention can be used for preparing ammonia in scientific researches.

The invention belongs to the field of preparation of high-temperature superconducting materials and particularly relates to a preparation method and application of high-volatility complex ligand barium precursor salt. After anhydrous beta-barium diketone precursor salt (Ba(tmhd)2) is prepared by being reacted with 2,2,6,6-tetramethyl-3,5-heptadione and taking barium as a raw material, a barium salt reaction system is directly added with fluorinated difluoromethane sulfonylimide as an auxiliary ligand L to obtain the colorless and transparent complex ligand barium precursor salt Ba(tmhd)2(L). With the technology, aggregation of the Ba(tmhd)2 precursor salt in the post-treatment process to form Ba4(tmhd)8 low-ploidy which is not easy to evaporate is inhibited, preparation of the complex ligand barium precursor salt is greatly simplified, and YBCO (yttrium barium copper oxide) superconducting films with excellent superconductivity are prepared by the aid of the complex ligand barium precursor salt.

Being suitable to etching copper or silver, the etching apparatus includes hydrogen dioxide trough, ammonium hydroxide trough, water trough, etch trough, pipe arrangement system, and temperature control device. The pipe arrangement system connects hydrogen dioxide trough, ammonium hydroxide trough, and water trough to the etch trough. Being setup around hydrogen dioxide trough, ammonium hydroxide trough, and etch trough, the temperature control device maintains temperature lower than room temperature and higher than 12 deg.C. The invention can prevent air cock from occurring inside pipe arrangement system, and can reduce volatilization speed of hydrogen dioxide and ammonium hydroxide. Thus, the etching solution maintains stable etching speed for thin film of copper or silver.