33results about How to "Evaporation rate is stable" patented technology

The invention provides an evaporating device and an evaporating method. According to the evaporating device disclosed by the invention, a crystal oscillator sheet baffle plate is arranged between an evaporation source and a crystal oscillator sheet, and the crystal oscillator sheet baffle plate can switch between two positions, namely a position shielding the crystal oscillator sheet and a position not shielding the crystal oscillator sheet; when the crystal oscillator sheet baffle plate is in the position shielding the crystal oscillator sheet, evaporation material deposits to the crystal oscillator sheet baffle plate, so as to prevent the evaporation material from depositing to the crystal oscillator sheet; and when the crystal oscillator sheet baffle plate is in the position not shielding the crystal oscillator sheet, the evaporation material deposits to the crystal oscillator sheet. When the evaporation device disclosed by the invention is applied to an evaporation process, in theinitial stage of evaporation, namely the evaporation stage of impurities on the surface of to-be-evaporated material, the crystal oscillator sheet baffle plate is in the position shielding the crystaloscillator sheet, so as to prevent impurities from depositing to the surface of the crystal oscillator sheet; and after evaporation of the impurities on the surface of the to-be-evaporated material is completed, the crystal oscillator sheet baffle plate is in the position not shielding the crystal oscillator sheet, and the evaporation material deposits to the surface of the crystal oscillator sheet, so that an evaporation rate monitoring device acquires a steady evaporation rate.

The invention discloses an evaporation system. The evaporation system comprises a feeding device, a feed port, a discharge port, a pushing unit, an evaporation device and a storage device, wherein the feeding device includes a feeding device shell; feeding space is defined in the feeding device shell; the feed port is formed in the feeding device shell; the discharge port is formed in the feeding device shell and far from the feed port; at least one part of the pushing unit is embedded in the feeding space for pushing raw materials in the feeding space to move from the feed port to the discharge port; the evaporation device is connected with the feeding device; and the storage device is connected with the feed port of the feeding device. The evaporation system has at least one of the following advantages: the evaporation system can realize continuous feeding to improve the production efficiency; and the continuous feeding guarantees better consistency of the raw materials and no residues of the raw materials, and can keep stable evaporation speed.

The invention provides a wire feeding mechanism of a vacuum film plating machine. The wire feeding mechanism comprises a wire supplying disc, a wire feeding mechanism body, a wire discharging nozzle and a heating crucible. The wire discharging nozzle extends into the heating crucible. The wire feeding mechanism body comprises a wire feeding rotating shaft, multiple wire feeding rolls and a power device, wherein the wire feeding rolls are fixed to the wire feeding rotating shaft; the power device provides power for the wire feeding rotating shaft; and the two ends of each wire feeding roll are provided with a wire protection sleeve and a wire pressing block. The wire feeding mechanism has the beneficial effects that the wire feeding speed of each evaporation boat is controlled through different diameters of the wire feeding rolls, thus the wire feeding amount is controlled; square resistance uniformity of a product is improved; product quality is improved; by arranging the wire pressing blocks, a metal wire in the conveying process can be located, the tail end of the aluminum wire can be constrained, and thus the tail end of the aluminum wire can be effectively prevented from sliding on a heating source; furthermore, the situation that generated aluminum chippings splash to an aluminum-plated film to damage the aluminum-plated film is prevented; and production quality of the aluminum-plated film is effectively guaranteed.

The invention belongs to the field of optical thin films, and relates to a high-damage threshold laser lens and a manufacturing method thereof. The laser lens of the invention comprises a substrate and coating layers. The coating layers alternately form multiple zirconia film layers and multiple silica film layers from the surface of the substrate, and the zirconia film layer adopts zircaloy for coating. The manufacturing method of the invention comprises steps of substrate preparation, pre-coating preparation and coating. According to the high-damage threshold laser lens capable of solving alow damage threshold by direct zirconia material evaporation and the manufacturing method thereof, the damage threshold of the zirconia film layer is raised to17J/cm<2> 10ns-coating 355 nm from 5 J/cm<2> 10ns-coating 355 nm.

The invention provides a crucible device and an evaporation device. The crucible device is used to evaporate metal aluminum materials. The crucible device comprises an outer layer crucible body and aninner layer crucible body; the outer layer crucible body is provided with an outer layer cavity whose surface is covered with a heat reflective coating; and the inner layer crucible body is providedwith a body part nested in the outer layer cavity of the outer layer crucible body. On the one hand, by arranging the heat reflective coating on the inner wall of the outer layer crucible body, the evaporation material in the crucible device can maintain a stable vaporization rate, and the evaporation rate is effectively increased; and on the other hand, grooves are formed in the upper part of theinner layer crucible body, and the grooves are provided with overflow holes which can be used to channel overflow liquid to the outer layer crucible body, so that the risk of liquid emerging from theupper surface of the crucible device and damaging the crucible device is reduced.

The invention discloses an attractant sustained-release microcapsule for Xylosandrus crassiusculus as well as a preparation method and application thereof. The capsule comprises a wall material and a core material, wherein the wall material is prepared from 2-methyl-2-methyl acrylate, 2-methyl-2-acrylic acid and dibenzoyl peroxide; the core material is prepared from Xylosandrus crassiusculus pheromone Conophthorin, normal hexane and paraffin; and polyvinyl alcohol is added into the wall material and the core material for emulsification to obtain the sustained-release microcapsule. The capsule is installed in a trapping and killing device and is used for trapping and killing the Xylosandrus crassiusculus, so that breeding of the Xylosandrus crassiusculus is stopped or reduced, and the purpose of protecting host plants is achieved.

The invention relates to the technical field of semiconductor technology, in particular to an evaporating cavity lining device, an evaporating system thereof and an evaporating device. The evaporating cavity lining device comprises a cavity assembly, wherein the cavity assembly comprises a first shell and a second shell; the first shell is provided with a first opening end and a second opening end arranged oppositely; the first opening end is externally connected with the evaporating device; a steam passage allowing steam to circulate is formed in the first shell; the second shell communicates with the second opening end; and a material storing area for storing the steam from the steam passage is formed in the second shell. The evaporating cavity lining device can ensure that the evaporating device warms organic material in advance, and the situation that the evaporated material enters an evaporating area to interfere with a base plate is avoided.

The invention provides an evaporation device and evaporation equipment. The evaporation device comprises an evaporation container and an anti-blocking cap which are connected or separated from each other; the anti-blocking cap comprises a first outlet, a first side wall, a first blade, a first opening, a second blade, a second opening and heating wires; the first side wall surrounds the first outlet; the first blade and the second blade are positioned in the first outlet and are fixed on the first side wall; the first blade surrounds the first opening; the second blade surrounds the second opening; the second opening is smaller than the first opening; the heating wires are arranged in the first side wall, the first blade and the second blade. The anti-blocking cap avoids instant large fluctuation of evaporation gas caused by melting, boiling or collapsing of evaporation raw materials in an evaporation container, and the emitting speed of the evaporation gas on the anti-blocking cap isstable. Therefore, the evaporation device realizes a stable evaporation rate, and further realizes an excellent evaporation effect; and in addition, the anti-blocking cap prevents the evaporation gasfrom being condensed on the second outlet of the evaporation container to cause blocking.

The invention discloses an evaporation source device which comprises an evaporation boat and hollow pipelines, wherein the hollow pipelines are tightly clung to the outer side of the evaporation boat in a uniform winding manner; circulating mediums are introduced into the hollow pipelines, and comprise a heating circulating medium and a cooling circulating medium. The evaporation source device adopts the manner that the circulating mediums are directly used for heating and cooling; after the heating circulating medium is quickly introduced, the evaporation time of an evaporation material can be reached within a quite short time period; after the cooling circulating medium is quickly introduced, the evaporation boat can be quickly cooled after the evaporation is completed, the evaporation material is saved, and the evaporation cost is reduced.

The invention discloses a method for preparing a compact AlQ3 film. A vacuum chamber is opened; a boron nitride crucible is arranged in the vacuum chamber; and a powder evaporation material AlQ3 is put in the crucible. The boron nitride crucible consists of a cover and a cavity; the cover and the cavity are tightly connected through a thread; a through hole is formed in the cover, and is aligned to an upper substrate of the vacuum chamber; the vacuum chamber is vacuumized to an ultrahigh-vacuum state; the ultrahigh-vacuum state is maintained by 20 minutes; and the vacuum chamber is degassed. The boron nitride crucible is heated to reach the current of 22-25 A; at this time, the high-temperature gas-state AlQ3 material is absorbed on the upper substrate of the vacuum chamber through the through hole; the current of a current source in the evaporation process is stable; and the temperature of the substrate in the whole process is room temperature. An organic film prepared by the method is high in gathering density; a device prepared by the film emits light to generate heat; and in the process of continuously increasing the temperature, the crystal cannot be changed, so that maintenance of the light emitting property of the device is facilitated.