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Simplified powder feeding and vaporization apparatus

A technology of evaporation device and evaporator, which is applied in the direction of vacuum evaporation plating, metal material coating process, coating, etc., can solve the problems of unexpected main body and dopant material metering control, etc., to reduce the risk of degradation, high The effect of evaporation rate

Inactive Publication Date: 2012-01-11
GLOBAL OLED TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, none of these early technologies anticipated the need for independent metrological control of host and dopant materials
Therefore, the delivery mechanism cannot, by virtue of its design, meter at the low speeds (1 μg / s-10 μg / s) required for independent adulterant supply

Method used

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  • Simplified powder feeding and vaporization apparatus
  • Simplified powder feeding and vaporization apparatus
  • Simplified powder feeding and vaporization apparatus

Examples

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Embodiment Construction

[0032] now turn image 3 , shows a three-dimensional cross-sectional view of an embodiment of a device according to the invention. The evaporation device 100 is a device for evaporating particulate material. The evaporation device 100 comprises a metering device comprising: a housing having a reservoir for containing particulate material; an opening in the reservoir for discharging material into the evaporation chamber; rotatable wire wheel brush in the brush. These components are described in more detail below. Reservoir 130 is located within housing 140 for containing particulate material. The particulate material may comprise a single component, or it may comprise two or more different material components, each material component having a different vaporization temperature. Although not shown, the reservoir 130 may also include larger storage and supply means located thereon to increase the volume of particulate material that may be loaded. Such containers and feeders ...

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Abstract

An apparatus (100) for vaporizing a particulate material, including: a metering apparatus including: a reservoir (130) for receiving particulate material: the reservoir having an opening (160) for discharging the particulate material into a vaporizing chamber (210); a rotatable wire wheel brush (170) disposed in the reservoir; wherein the dimensions of the reservoir and the wire wheel brush are selected so that the wire wheel brush cooperates with the interior walls of the reservoir to fluidize the particulate material and wherein a metered portion of the particulate material is entrained in the tines of the wire wheel brush and subsequently forcefully released into the reservoir opening; and a flash evaporator (120) that receives and vaporizes the metered material.

Description

technical field [0001] The invention relates to the metering of particulate material into an evaporation device over a wide range of feed rates. Background technique [0002] For batch processing in a vacuum, it is necessary to be able to dispense small quantities of finely divided powders with high gravimetric or volumetric accuracy. For continuous processing in a vacuum, it is also necessary to dispense the powder in a continuous stream with high precision and consistency at the dispense rate. For example, for some processes, the desired weight accuracy is plus or minus 10 micrograms, and the rate consistency is plus or minus 10 micrograms per second. [0003] The electronics industry in particular requires the metering of small quantities of powdered material to evaporation zones for direct vapor deposition or for precursors in chemical vapor deposition (CVD). There is also a need to be able to accurately and precisely meter quantities of material at very high speeds (e...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/12C23C14/24
CPCC23C14/12C23C14/246C23C14/24
Inventor M·龙
Owner GLOBAL OLED TECH
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