Silicon wafer cleaning and texturing device

Abstract

The invention discloses a silicon wafer cleaning and texturing device, which can be convenient for texturing temperature control and ensure that a silicon wafer is always in a wet state when the silicon wafer undergoes the silicon wafer cleaning and texturing processes. The silicon wafer cleaning and texturing device comprises a silicon wafer texturing trough, a silicon wafer transfer device and asilicon wafer cleaning device, wherein the silicon wafer transfer device is arranged between the silicon wafer texturing trough and the silicon wafer cleaning device. By adopting the silicon wafer cleaning and texturing device, the texturing temperature control precision is high, the chemical reaction in the entire process tank is stable and controllable, effective control of the reaction speed and volatilization amount of a solution can be realized, and the adjustment of the process is facilitated; and the silicon wafer is sprayed during the transfer process so as to ensure that the siliconwafer always maintains a wet state during operation, thereby effectively avoiding the occurrence of ''edge scratched wafer'', and improving product quality.

Description

technical field [0001] The invention relates to silicon chip texturing, in particular to a silicon chip cleaning and texturing device. Background technique [0002] It is well known that silicon wafers need to be cleaned after a series of processing procedures. The purpose of cleaning is to eliminate all kinds of pollutants adsorbed on the surface of silicon wafers, and to make a suede structure that can reduce the reflection of sunlight on the surface. The degree of cleanliness directly affects the yield and reliability of cells. Texturing is the first process for manufacturing crystalline silicon cells, also known as "surface texturing". The effective textured structure makes the incident light reflect and refract multiple times on the surface of the silicon wafer, which increases the light absorption, reduces the reflectivity, and helps to improve the performance of the battery. [0003] Considering the important role of the texturing process section on the entire produ...

AI Technical Summary

Problems solved by technology

The existing texturing tanks are not stable enough to control the solution temperature, and cannot guarantee the solution temperature requirements for texturing

[0005] At the same time, in the prior art, although there is a device for continuous silicon wafer cleaning and texturing, during the process of transferring the silicon wafer from the cleaning solution to the texturing tank, the silicon wafer is prone to watermarks due to exposure to the air. As a result, the quality of silicon wafers is affected

Images