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Polarized selection reflection type grating based on metal multilayer dielectric film

A multi-layer medium and selective reflection technology, applied in the field of reflection grating, can solve the problem of wide spectrum without 1550nm central band, and achieve high diffraction efficiency

Active Publication Date: 2018-05-08
JINAN UNIVERSITY
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In the prior art, there is no polarization-selective reflective grating based on metal multilayer dielectric film that provides a wide spectrum, wide-angle spectrum, and high diffraction efficiency for the central band of 1550 nanometers.

Method used

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  • Polarized selection reflection type grating based on metal multilayer dielectric film
  • Polarized selection reflection type grating based on metal multilayer dielectric film
  • Polarized selection reflection type grating based on metal multilayer dielectric film

Examples

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Effect test

Embodiment 1

[0026]The polarization selective reflective grating based on the metal multilayer dielectric film for the central wavelength of 1550 nm includes a quartz substrate 1, a metal layer 2, a matching layer 3 and a grating etching layer 4 plated sequentially from the inside to the outside. The period of the grating etching layer 4 is 1243.62 nanometers, the duty ratio is 0.23, and the material of the first low refractive index film layer 41 in the inner layer of the grating etching layer 4 is SiO 2 , the thickness is 142.23 nanometers; the material of the first high refractive index film layer 42 in the outer layer is Si, and the thickness is 280.53 nanometers. The material of the second low refractive index film layer 31 in the inner layer of the matching layer 3 is SiO 2 , the thickness is 273.1 nanometers; the material of the second high refractive index film layer 32 of the outer layer is Si, and the thickness is 121.13 nanometers, and the thickness of the metal layer 2 is 200 n...

Embodiment 2

[0028] The polarization selective reflective grating based on the metal multilayer dielectric film for the central wavelength of 1550 nm includes a quartz substrate 1, a metal layer 2, a matching layer 3 and a grating etching layer 4 plated sequentially from the inside to the outside. The period of the grating etching layer 4 is 1243.62 nanometers, the duty ratio is 0.23, the inner layer is the first low refractive index film layer 41, and the material is SiO 2 , thickness 142.23 nanometers, the outer layer is the first high refractive index film layer 42, the material is Si, and the thickness is 280.53 nanometers; the inner layer of the matching layer 3 is the second low refractive index film layer 31, the material is SiO 2 , the thickness is 273.1 nanometers; the outer layer is the second high refractive index film layer 32, the material is Si, the thickness is 121.13 nanometers, and the thickness of the metal layer 2 is 200 nanometers. Such as Figure 4 As shown, at the in...

Embodiment 3

[0030] The polarization selective reflective grating based on the metal multilayer dielectric film for the central wavelength of 1550 nm includes a quartz substrate 1, a metal layer 2, a matching layer 3 and a grating etching layer 4 plated sequentially from the inside to the outside. The period of the grating etching layer 4 is 1243.62 nanometers, the duty ratio is 0.23, the inner layer is the first low refractive index film layer 41, and the material is SiO 2 , thickness 142.23 nanometers, the outer layer is the first high refractive index film layer 42, the material is Si, and the thickness is 280.53 nanometers; the inner layer of the matching layer 3 is the second low refractive index film layer 31, the material is SiO 2 , the thickness is 273.1 nanometers; the outer layer is the second high refractive index film layer 32, the material is Si, the thickness is 121.13 nanometers, and the thickness of the metal layer 2 is 200 nanometers. In addition, define the parameter Re=T...

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Abstract

The invention discloses a polarized selection reflection type grating based on a metal multilayer dielectric film used for a 1550 nanometer center wavelength. The grating comprises a quartz substrate,a metal layer, a matching layer and a grating etching layer which are successively plated from inside to outside. The grating etching layer comprises a first low refractive index film and a first high refractive index film which are successively plated from inside to outside. The matching layer comprises a second low refractive index film and a second high refractive index film which are successively plated from inside to outside. A period of the grating etching layer is 1200-1300 nanometers and a duty ratio is 0.2-0.4. The thickness of the first low refractive index film is 100-160 nanometers, the thickness of the first high refractive index film is 240-310 nanometers, the thickness of the second high refractive index film is 90-150 nanometers and the thickness of the second low refractive index film is 240-300 nanometers. The thickness of the metal layer is greater than 50 nanometers. The grating possesses characteristics of a wide spectrum, a wide angular spectrum, high diffractionefficiency and the like, and the grating shows completely different diffraction characteristics to different polarized incident light.

Description

technical field [0001] The invention relates to the technical field of reflective gratings, in particular to a polarization selective reflective grating based on a metal multilayer dielectric film. Background technique [0002] In general, metal multilayer dielectric film gratings are widely used in high-power laser systems because they not only have high diffraction efficiency but also have high resistance to laser damage threshold and other characteristics. However, metal multilayer dielectric film gratings can be used not only as pulse compression gratings in high-power ultrashort pulse laser systems, but also as polarization-selective gratings. The traditional polarization selective grating is usually composed of a multi-layer dielectric film structure. The disadvantage of this kind of polarization selective grating is that the bandwidth is relatively narrow, and it is very sensitive to the change of the incident angle of the incident light. Therefore, in order to meet ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G02B5/18
CPCG02B5/1809G02B5/1814G02B5/1861
Inventor 关贺元江梦江李翰光郎宇威王晓丽陈哲余健辉卢惠辉朱文国
Owner JINAN UNIVERSITY
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