Method for forming film layer on substrate and device for forming film layer on substrate
A film layer and substrate technology, applied in semiconductor/solid-state device testing/measurement, semiconductor devices, electrical components, etc., can solve the problems of not being able to monitor the film thickness in real time and the film forming rate in real time, so as to reduce the production cost. Cost, improvement of process yield, and the effect of increasing production rate
Active Publication Date: 2019-11-15
HEFEI XINSHENG OPTOELECTRONICS TECH CO LTD +1
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Problems solved by technology
[0004] However, since the above-mentioned methods all detect the thickness of the formed film layer after the film layer is produced, they cannot monitor the film thickness in the process in real time. Secondly, the optical film thickness is obtained by calculating the refractive index and by In the method of calculating the film thickness by the oxygen content method, there will be measurement errors
In addition, the above method obviously cannot realize the real-time monitoring of the film formation rate.
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[0079] Specific embodiments of the present invention will be described in detail below in conjunction with the accompanying drawings. It should be understood that the specific embodiments described here are only used to illustrate and explain the present invention, and are not intended to limit the present invention.
[0080] refer to figure 1 with figure 2 , the first aspect of the present invention relates to a method S100 of forming a film layer on a substrate. Such as figure 2 As shown, the substrate 200 includes a target area 210 and a detection area 220 outside the target area 210 .
[0081] The above-mentioned substrate 200 may be a base substrate of an OLED display substrate in the display field. Correspondingly, the above-mentioned film layer may be a structure for forming film layers required for an OLED display substrate on the base substrate, such as an insulating layer and a conductive film layer. The concrete making material of this insulating layer, for ex...
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The invention discloses a method and equipment for forming a film layer on a substrate. The method includes: setting a detection board in the detection area, the detection board includes at least one detection unit, and each detection unit includes a first detection electrode and a second detection electrode arranged at intervals; forming a film layer, including a target film layer and a detection film layer, The detection film layer fills the gap between the first detection electrode and the second detection electrode; in the process of forming the film layer, the thickness of the detection film layer is detected, and the thickness of the formed film layer is calculated according to the thickness and the film formation time Film formation rate, according to the film formation rate, adjust the current film formation rate. It can accurately detect the thickness of the detection film layer formed on the substrate, and guide the production process of the target film layer according to the thickness of the detection film layer and the film formation rate, effectively improve the production rate, and improve the process yield of the film layer.
Description
technical field [0001] The invention relates to the field of display technology, in particular to a method for forming a film layer on a substrate and a device for forming a film layer on the substrate. Background technique [0002] Organic light-emitting diode (Organic Light-Emitting Diode, OLED) is a kind of thin-film light-emitting device made of organic semiconductor material, which has the characteristic of self-luminescence. OLEDs are primarily made with thin coatings of organic materials and glass substrates, and do not require a backlight. Therefore, these organic materials actively emit light when there is an electrical current path. Since the OLED is driven by current, the luminance of the OLED is related to the magnitude of the current flowing through the OLED. The electrical performance and stability of the driving thin-film transistor (TFT) directly affect the display of the above-mentioned OLED. Effect, especially when the film thickness control of the TFT su...
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IPC IPC(8): H01L51/56H01L21/66
CPCH01L22/12H01L22/26H10K71/00
Inventor 程磊磊周斌王东方赵策黄勇潮刘宁汪军
Owner HEFEI XINSHENG OPTOELECTRONICS TECH CO LTD