The invention provides a monolithic three-dimensional integrated photoelectric
detector and a preparation method thereof. The preparation method comprises the following steps: forming an isolation
passivation layer on a
readout integrated circuit serving as a substrate of the photoelectric
detector; forming a source conductive through hole, a drain conductive through hole and a
bottom gate contact hole in the isolation
passivation layer; a conductive material is deposited and planarized, the source
electrode conductive through hole, the drain
electrode conductive through hole and the
bottom gate contact hole are filled with the conductive material, the conductive material in the source
electrode conductive through hole forms a source electrode
conductive channel, the conductive material in the drain electrode conductive through hole forms a drain electrode
conductive channel, and the conductive material in the
bottom gate contact hole forms a bottom gate electrode layer; forming a bottom
gate dielectric layer on the planarized surface, and forming a channel layer on the bottom
gate dielectric layer; forming a source electrode and a drain electrode, wherein the source electrode and the drain electrode are electrically connected with the connecting port of the read-out
integrated circuit through a source electrode
conductive channel and a drain electrode conductive channel respectively; and forming a top gate structure which comprises a top
gate dielectric layer and a photosensitive layer.