Stable electroplate liquid
A technology of electroplating solution and stability, which is applied in the field of stable electroplating solution, can solve the problems of weak plating ability, poor stability of electroplating solution, and slow plating speed, and achieve fast plating speed, strong throwing ability and reduced surface tension Effect
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Embodiment 1
[0015] A kind of stable electroplating solution of the present invention, described comprises copper sulfate pentahydrate, sulfuric acid, hydrochloric acid, accelerator and wetting agent, and described accelerator is the mixture of one or more mercaptan compounds, described The wetting agent is a mixture of one or more polyalcohol compounds; the concentration of copper sulfate pentahydrate in the stable electroplating solution is 70g / L, the concentration of sulfuric acid is 96mL / L, and the concentration of hydrochloric acid is 44mg / L L, the concentration of the accelerator is 0.5mL / L, and the concentration of the wetting agent is 13mL / L. A preferred composition of the accelerator includes methyl mercaptan, ethanethiol, ethanedithiol, 1-propanethiol and 1,3-propanedithiol; the content percentage of the accelerator composition is: Thiol 40%, Ethanethiol 30%, Ethanedithiol 10%, 1-Propanedithiol 10%, and 1,3-Propanedithiol 5%. A preferred composition of the wetting agent includes...
Embodiment 2
[0017] A kind of stable electroplating solution of the present invention, described comprises copper sulfate pentahydrate, sulfuric acid, hydrochloric acid, accelerator and wetting agent, and described accelerator is the mixture of one or more mercaptan compounds, described The wetting agent is a mixture of one or more polyalcohol compounds; the concentration of copper sulfate pentahydrate in the stable electroplating solution is 77g / L, the concentration of sulfuric acid is 100mL / L, and the concentration of hydrochloric acid is 50mg / L L, the concentration of the accelerator is 0.7mL / L, and the concentration of the wetting agent is 16mL / L. A preferred composition of the accelerator includes methyl mercaptan, ethanethiol, ethanedithiol, 1-propanethiol and 1,3-propanedithiol; the content percentage of the accelerator composition is: Mercaptan 45%, Ethanethiol 35%, Ethanedithiol 15%, 1-Propanedithiol 15%, and 1,3-Propanedithiol 8%. A preferred composition of the wetting agent inc...
Embodiment 3
[0019] A kind of stable electroplating solution of the present invention, described comprises copper sulfate pentahydrate, sulfuric acid, hydrochloric acid, accelerator and wetting agent, and described accelerator is the mixture of one or more mercaptan compounds, described The wetting agent is a mixture of one or more polyalcohol compounds; the concentration of copper sulfate pentahydrate in the stable electroplating solution is 85g / L, the concentration of sulfuric acid is 108mL / L, and the concentration of hydrochloric acid is 65mg / L L, the concentration of the accelerator is 0.9mL / L, and the concentration of the wetting agent is 20mL / L. A preferred composition of the accelerator includes methyl mercaptan, ethanethiol, ethanedithiol, 1-propanethiol and 1,3-propanedithiol; the content percentage of the accelerator composition is: Thiol 50%, Ethanethiol 0%, Ethanedithiol 20%, 1-Propanedithiol 20%, and 1,3-Propanedithiol 10%. A preferred composition of the wetting agent include...
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