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92results about How to "Good throwing ability" patented technology

Method for non-cyanide imitation gold plating of Cu-Zn binary alloy

ActiveCN103866356AGood dispersionStrong depth capabilityDispersityChemical treatment
The invention provides a plating solution for the non-cyanide imitation gold plating of a Cu-Zn binary alloy on low carbon steel, and its use method in order to improve the problems of severe toxicity, bad anode dissolvability and high treatment cost of three wastes of cyanide-containing plating solutions and the problems of complex composition, narrow range of technological parameters and unrealistic imitation gold color of non-cyanide plating solutions in present imitation gold plating technologies. The method is characterized in that the method comprises the following steps: an activated matrix can be directly plated without cleaning, so the operation is simple; the imitation gold plating solution is composed of potassium pyrophosphate, copper sulfate, zinc sulfate and glycerin, so the imitation gold plating solution has the advantages of green property, environmental protection, good dispersity, strong homogeneous plating ability, simple composition and easy maintenance; and the prepared gold imitation plating solution can meet the requirements of the cross cut test requirements of national standard GB9286-1998 paint and varnish film; and the obtained coating is passivated and seal-protected, and the protected coating meets the 5% brine neutral salt spray test indexes of the national standard GB5938-86 Corrosion Resistance Test Method of Metal Coating and Chemical Treatment Layer of Light Industrial Product, and can be used as a decorative coating.
Owner:INST OF PROCESS ENG CHINESE ACAD OF SCI

High-phosphorus chemical nickel-plating solution

The invention discloses a high-phosphorous chemical nickel-plating solution which comprises a cylinder opening solution and a supplement solution. The cylinder opening solution contains nickel sulfate, sodium hypophosphite, citric acid, lactic acid, sodium acetate, succinic acid, potassium iodate, potassium iodide, nitrilotriacetic acid, cerous sulfate, copper sulfate, benzotriazole, benzimidazole with the concentration being 2-10 mg / L, 5-25 mL / L of OP-10 with the concentration being 5-25 mL / L and the balance pure water. The nickel-plating solution has the advantages that cost is low, the excellent plating ability is achieved, the cylinder opening solution is stable, glossiness is achieved, the magnetism level requirement is met, and the service life reaches 11.0 MTO; during the service life, the average sedimentation rate is 12-14 [mu]m / h, the phosphorus content of a plating layer is 10%-14%, the time for neutral salt spraying is longer than or equal to 96 h (the thickness of the plating layer is 18-25 [mu]m), and the time for a purification resistant nitric-acid test is longer than or equal to 8 min (the thickness of the plating layer is 18-25 [mu]m); the magnetism level is lower than or equals to 200 gamma (specifically, 1 gamma is equal to 1 nT, and in general, remanence in the aerospace field takes gamma as a unit), the western country standard is met, and the magnetism is required to meet the NMB magnetism level; and the plating solution is free of lead and cadmium, conforms to the RoHS command and is an environment-friendly high-phosphorous chemical nickel-plating solution.
Owner:贵阳华科电镀有限公司

Repairing method of scrapped continuous casting crystallizer copper plate

The invention discloses a repairing method of a scrapped continuous casting crystallizer copper plate. The repairing method comprises the steps of (1) pretreatment: carrying out degreasing treatment, mechanical sand blasting scuffing treatment, electrolytic degreasing treatment, ultrasonic degreasing treatment and acid spraying activating treatment on a copper plate base material subjected to machining, so as to obtain a to-be-cast copper plate base material; (2) electroforming solution injection: injecting an electroforming solution into an electroforming tank, adjusting the pH, and heating the electroforming solution till the temperature reaches a set value; and (3) electroforming: putting the to-be-cast copper plate base material adopted as a cathode into the electroforming tank, putting an anode into the electroforming tank, switching on the power, and stopping electroforming till the thickness of a silver-copper alloy plating reaches a set value. According to the repairing method, the crystallizer copper plate base material at the scrapping limit is repaired and reutilized through adopting an easy and feasible preparation method, the obtained crystallizer copper plate is excellent in performance, the service life of the crystallizer copper plate is prolonged through the silver-copper alloy plating, the production cost is improved, and the sustainable development property is high.
Owner:XIXIA LONGCHENG SPECIAL MATERIALS CO LTD

Electroplate copper liquor for printed circuit board

The invention belongs to the electroplating field, in particular relates to a novel electroplating solution with excellent plating property used in the process of plating copper in the production and manufacturing of a circuit board. The electroplating copper solution of a printed circuit board comprises a copper sulphate solution and a dispersant; the dispersant is mainly sodium salt solution containing sulfosuccinate group and ethylene oxide group, and the dispersant comprises alkyl ester sodium sulfonate salt of succinic acid, succinate sodium salt containing amine and the succinate sodium salt containing ethoxy. An anion surfactant containing the sodium salt of the sulfosuccinate group and the ethylene oxide group is taken as the dispersant for a used additive, which significantly improves the comprehensive electroplating property of the electroplating copper solution, and ensures that the electroplating solution has high dispersing property, excellent ductibility and better plating homogeneity. The invention can provide the novel electroplating copper solution with the high dispersing property, the excellent ductibility and the better plating homogeneity. The copper solution can meet requirements for high density and high accuracy of plating copper on the printed circuit board.
Owner:深圳市天泽科技实业有限公司

Chemical silver plating solution and preparation method thereof

The invention discloses a chemical silver plating solution. The silver plating solution comprises silver nitrate, succimide, tartaric acid, trolamine, methylsulfonic acid and water. The silver plating solution per liter comprises 5-30g of the silver nitrate, 30-160g of the succimide, 10-38g of the tartaric acid and 6-68g of auxiliary complexing agents; alkali is used for adjusting the PH value of the silver plating solution to be in a range of 9-11; the auxiliary complexing agents are the trolamine and the methylsulfonic acid; the silver plating solution per liter comprises 1-38g of the trolamine and 5-30g of the methylsulfonic acid; and the alkali is sodium hydroxide or potassium hydroxide. The silver plating solution has the advantages that comprehensive quality of plating layers of the chemical silver plating solution is good, and the chemical silver plating solution can replace hydrazine, formaldehyde and dimethylamino borane, serves as a reducing agent process and is used for plating silver. The storage performance of the silver plating solution is stable, the waste of the silver plating solution can be avoided, and the application of the silver plating solution is wide. The preparation of the silver plating solution is flexible and the silver plating solution is convenient to use.
Owner:淮安市曼蒂科技发展有限公司

Electroless plating solution and method for cladding surfaces of SiC particles with Ni-P through electroless plating solution

The invention relates to an electroless plating solution which is used for cladding the surfaces of SiC particles with Ni-P, and further relates to a method for cladding the surfaces of the SiC particles with Ni-P through the electroless plating solution. The method comprises the following steps that (1) SiC surface cleaning treatment is conducted; (2) the SiC particles are coarsened; (3) the SiC particles are activated and sensitized; (4) the electroless plating solution is prepared, and plating is conducted; and (5) electroless plating aftertreatment is conducted. The SiC surface cladding effect is the best when the concentration of [Ni2+] in the electroless plating solution is 0.25 mol / L, the concentration of [NH4+] is 0.6 mol / L, the concentration ratio of [Ni2+] to [H2PO2-] is 0.4, the concentration of citric acid is 0.1 mol / L, and trace lactic acid and thiourea exist. The electroless plating solution is used for complete nickel cladding of the SiC particles, and the problem that the SiC particles are low in wettability and consequently the SiC particles are difficult to composite with molten metal is solved; and the electroless plating solution is low in maintaining cost and long in service life.
Owner:SUZHOU JINCANG ALLOY NEW MATERIAL +1
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