Electroplate copper liquor for printed circuit board
A technology for printed circuit boards and copper electroplating, applied in printed circuits, printed circuit manufacturing, electrical components, etc., can solve the problems of reducing the flexibility of the coating, the brittleness of the coating and the increase and decrease of the porosity, so as to improve the comprehensive electroplating performance, Good throwing power and the effect of expanding the brightness range
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Embodiment 1
[0036] The distribution ratio of each component of the electroplating copper solution is as follows:
[0037] Copper sulfate: 50g / L
[0038] Sulfuric acid: 160g / L
[0039] Chloride ion concentration: 35ppm
[0040] Dispersant used: disodium ether sulfosuccinate monoester (DAPS) Adding ratio: 0.05g / L
[0041] Crystal refiner: 2-mercaptobenzimidazole (M) Adding ratio: 0.5ppm
[0042] Brightener: sodium thiopropanesulfonate Addition ratio: 1ppm
[0043] Temperature: 20—30℃
[0044] Current density: 2A / dm2
[0045] Anode current density: 1A / dm 2
[0046] The copper electroplating solution configured according to the above components has been filtered many times, vigorously stirred by air, and the cathode is moved mechanically. The moving speed is controlled at 0.6 m / min, and the copper electroplating solution is continuously circulated during the electroplating process.
Embodiment 2
[0048] The distribution ratio of each component of the electroplating copper solution is as follows:
[0049] Copper sulfate: 90g / L
[0050] Sulfuric acid: 200g / L
[0051] Chloride ion concentration: 80ppm
[0052] Dispersant used: dipentyl sodium succinate (AY-65) Adding ratio: 10g / L
[0053] Crystal refiner: mercaptobenzothiazole Addition ratio: 0.2ppm
[0054] Brightener: sodium thiazoline propane sulfonate Addition ratio: 5ppm
[0055] Temperature: 20—30℃
[0056] Current density: 3 / dm 2
[0057] Anode current density: 1A / dm 2
[0058] The copper electroplating solution configured according to the above components has been filtered many times, vigorously stirred by air, and the cathode is moved mechanically. The moving speed is controlled at 1 m / min, and the copper electroplating solution is continuously circulated during the electroplating process.
Embodiment 3
[0059] Embodiment 3: (best embodiment)
[0060] The distribution ratio of each component of the electroplating copper solution is as follows:
[0061] Copper sulfate: 75g / L
[0062] Sulfuric acid: 180g / L
[0063] Chloride ion concentration: 60ppm
[0064] Dispersant used: 1-sulfonyl succinate-2-oxyethylene-3-hydroxyl-4-sodium succinate (TPSO3) adding ratio: 2.5g / L
[0065] Crystal refiner: 2-Mercaptobenzimidazole (M) Adding ratio: 0.4ppm
[0066] Brightener: sodium polydisulfide dipropane sulfonate Addition ratio: 3ppm
[0067] Temperature: 20-30°C
[0068] Current density: 2.2A / dm 2
[0069] Anode current density: 1A / dm 2
[0070] The copper electroplating solution configured according to the above components has been filtered many times, vigorously stirred by air, and the cathode is moved mechanically. The moving speed is controlled at 1.2 m / min, and the copper electroplating solution is continuously circulated during the electroplating process.
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