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Quantum dot film coating method and system

A coating system and quantum dot technology, applied in the field of quantum dot coating, can solve the problems that cannot be applied to the preparation of new quantum dot nanoparticle OLED display devices

Inactive Publication Date: 2018-06-15
BOE TECH GRP CO LTD
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0004] However, the evaporation method is suitable for the processing of small molecules in OLED display devices, but cannot be applied to the preparation of new quantum dot nanoparticles OLED display devices

Method used

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  • Quantum dot film coating method and system

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Embodiment Construction

[0037] In order to further explain the technical means and effects that the present invention adopts to achieve the intended purpose of the invention, below in conjunction with the accompanying drawings and preferred embodiments, the quantum dot coating method and system proposed according to the present invention will be described in terms of its specific implementation, structure, characteristics and Its effect is described in detail below. In the following description, different "one embodiment" or "embodiment" do not necessarily refer to the same embodiment. Furthermore, the particular features, structures, or characteristics of one or more embodiments may be combined in any suitable manner.

[0038] A quantum dot coating method provided in this embodiment, firstly mix quantum dot nanoparticles and conductive solvent to form a conductive spray, then apply a voltage to the conductive spray and atomize it, and under the action of an electric field, the The charged atomized ...

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Abstract

The invention relates to a quantum dot film coating method and system and relates to the technical field of quantum dot film coating. The quantum dot film coating method and system mainly achieve thetechnical effect that film coating can be conducted on quantum dot nano particles. According to the main technical scheme, the quantum dot film coating system comprises a voltage application atomization unit and an electric field application unit, wherein the voltage application atomization unit is used for applying the voltage to an electrically-conducting spray for atomization, so that an electrified atomization spray is formed; and the electric field application unit is used for applying an electric field to the electrified atomization spray. In the nano quantum dot film coating process, the quantum dot nano particles can be mixed with electrically-conducting solvent in the first place, so that the electrically-conducting spray is formed, and then the voltage is applied to the electrically-conducting spray for atomization, so that the electrified atomization spray is formed; under the effect of the applied electric field, the electrified atomization spray is deposited onto a deposition substrate; and then, drying can be conducted on the electrified atomization spray deposited on the deposition substrate, so that a quantum dot film layer is formed on the deposition substrate. Compared with the prior art, quantum dot film coating can be achieved.

Description

technical field [0001] The invention relates to the technical field of quantum dot coating, in particular to a quantum dot coating method and system. Background technique [0002] Currently, the OLED (Organic Light Emitting Diode, Organic Light Emitting Diode) display device has attracted widespread attention due to its advantages of simple structure, high-quality dynamic picture, wide viewing angle, fast response speed, and flexibility. [0003] OLED display devices have become the focus and focus of current research. In the prior art, the basic structure of an OLED display device includes an anode, a light-emitting layer, and a cathode. There are many methods for forming a film of the light-emitting layer, such as evaporation and film formation. Since the evaporation film formation method has the advantages of simple operation, easy control of film thickness, and little pollution to the film, the evaporation film formation method is often used in the prior art to form the...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C26/00
CPCC23C26/00
Inventor 陈右儒张渊明
Owner BOE TECH GRP CO LTD
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