A pixel unit structure and manufacturing method with increased floating drain capacitance
A technology of pixel unit and manufacturing method, which is applied in the field of image sensors, can solve problems such as the difficulty in changing the thickness of gate oxide, affecting the sensitivity of pixel units, and the decrease of photosensitive area of pixel units, so as to achieve the effect of increasing capacitance and increasing overlapping capacitance
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[0034] The specific embodiment of the present invention will be further described in detail below in conjunction with the accompanying drawings.
[0035] It should be noted that, in the following specific embodiments, when describing the embodiments of the present invention in detail, in order to clearly show the structure of the present invention for the convenience of description, the structures in the drawings are not drawn according to the general scale, and are drawn Partial magnification, deformation and simplification are included, therefore, it should be avoided to be interpreted as a limitation of the present invention.
[0036] In the following specific embodiments of the present invention, please refer to Figure 3-Figure 5 , image 3 It is a schematic diagram of a layout structure of a pixel unit with increased floating drain capacitance in a preferred embodiment of the present invention; Figure 4 is along image 3 A partial schematic diagram of the pixel unit ...
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