Glass substrate for flat panel displays and method for manufacturing same
A technology of glass substrates and manufacturing methods, applied in glass manufacturing equipment, manufacturing tools, glass production, etc., capable of solving problems such as thermal shrinkage of glass substrates
Pending Publication Date: 2018-07-24
AVANSTRATE INC
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Problems solved by technology
Therefore, the thermal shrinkage of the glass substrate that occurs during the manufacture of the display panel, which causes variations in the pitch of the pixels, becomes a problem.
In addition, suppression of thermal shrinkage is also a problem even in glass substrates on which OS-TFTs are formed.
Method used
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Examples
Experimental program
Comparison scheme
Effect test
Embodiment 1～34
[0170] The sample glasses of Examples 1-34 and Reference Examples 1-4 were produced according to the following procedure so that it might become the glass composition shown in Table 1. The devitrification temperature, Tg, average coefficient of thermal expansion in the range of 100 to 300° C., thermal contraction rate, density, and strain point were determined for the obtained sample glass and sample glass substrate.
[0171] [Table 1]
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[0173]
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[0176]
[0177] (Production of sample glass)
[0178] First, silica, alumina, boron oxide, potassium carbonate, basic magnesium carbonate, calcium carbonate, strontium nitrate, barium nitrate, silica, and ferric oxide, which are common glass raw materials, were used to obtain the The glass raw material batch (hereinafter referred to as batch) was blended in such a manner as to show the glass composition. It should be noted that the glass was prepared in an amount of 400 g.
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Abstract
The present invention provides: a glass substrate for flat panel displays, which has a good balance between low thermal shrinkage and suppression of devitrification; and a flat panel display. The glass substrate for the flat panel displays of the present invention contains, in mol%, 55-80% of SiO2, 8-20% of Al2O3, 0-8% of B2O3, more than 0% but 15% or less of MgO, 0-20% of CaO, 0-15% of SrO, and 0-10% of BaO, with SiO2 + 2 x Al2O3 being 100% or less. This glass substrate for flat panel displays has a molar ratio B2O3 / (SiO2 + Al2O3) of 0-0.12, a molar ratio MgO / RO within the range of 0.15-0.9,a devitrification temperature of less than 1,280 DEG C, and a thermal shrinkage of 3 ppm or more but less than 75 ppm as calculated by the formula below after being heated from room temperature at 10DEG C / min, maintained at 550 DEG C for 2 hours, and cooled to room temperature at 10 DEG C / min. Thermal shrinkage (ppm) = {amount of shrinkage of glass before and after heat treatment / length of glassbefore heat treatment}*106.
Description
[0001] This application is a divisional application. The international application number of the original application is PCT / JP2012 / 083702, the Chinese national application number is 201280003047.2, and the application date is December 26, 2012. The invention name is "Glass substrate for flat panel display and its Manufacturing method". technical field [0002] The invention relates to a glass substrate for a flat panel display and a manufacturing method thereof. In particular, the present invention relates to a low-temperature polysilicon thin film transistor (hereinafter referred to as LTPS-TFT (Low-Temperature-Polycrystalline-Silicon Thin-Film-Transistor)) glass substrate for a flat panel display, a glass substrate for a flat panel display. In addition, the present invention relates to a glass substrate for a flat panel display of an oxide semiconductor thin film transistor (hereinafter referred to as OS-TFT (Oxide-Semiconductor Thin-Film-Transistor)) flat panel display. I...
Claims
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IPC IPC(8): C03C3/091C03C3/093C03C3/087G02F1/1333H01L27/32
CPCC03C3/091Y02E10/549G02F1/133302Y02P70/50C03B5/43C03B17/064C03B25/12Y02P40/57H10K77/10
Inventor 小山昭浩阿美谕市川学
Owner AVANSTRATE INC