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Exposure device, exposure device control method, and device manufacturing method

An exposure device and control system technology, which is applied in the field of component manufacturing, can solve problems such as difficult masking, difficult correction of nonlinear control errors, and poor controllability

Inactive Publication Date: 2018-08-03
NIKON CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0004] However, in the pneumatic stage, nonlinear control errors that are difficult to correct sometimes occur, and the controllability is worse than that of the electromagnetic motor.
In addition, in the case of using an electromagnetic motor, there is also a method of shielding the magnetism from the electromagnetic motor with a magnetic shield, but it is difficult to completely shield

Method used

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  • Exposure device, exposure device control method, and device manufacturing method
  • Exposure device, exposure device control method, and device manufacturing method
  • Exposure device, exposure device control method, and device manufacturing method

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Embodiment Construction

[0026] Below, based on Figure 1 to Figure 11 (B) One embodiment will be described. figure 1 , schematically shows the configuration of an electron beam exposure apparatus 100 according to an embodiment. The electron beam exposure apparatus 100 is equipped with an electron beam optical system as described later, therefore, hereinafter, the Z axis is taken to be parallel to the optical axis of the electron beam optical system, and it moves when performing scanning exposure described later in a plane perpendicular to the Z axis. The scanning direction of the wafer W (stage 26) is defined as the Y-axis direction, the direction perpendicular to the Z-axis and the Y-axis is defined as the X-axis direction, and the rotation (tilt) directions around the X-axis, Y-axis, and Z-axis are respectively The description will be made assuming that the θx, θy, and θz directions are used.

[0027] In this embodiment, a configuration using an electron beam will be described as an example of a ...

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Abstract

An exposure device (100) comprises: an irradiation device (30) that irradiates a target (W) with an electron beam; a stage (26) that retains the target; a stage drive system including an electromagnetic motor that drives the stage; and a control system that controls the stage drive system on the basis of the irradiation state of the electron beam on the target. The control system changes the content of control of the stage drive system during irradiation and during non-irradiation of the electron beam on the target. Due to this configuration, deviations in the irradiation position of the electron beam on the target can be suppressed when driving the stage using the electromagnetic motor as the drive source of the stage.

Description

technical field [0001] The present invention relates to an exposure device, a control method of the exposure device, and a component manufacturing method, and in particular to an exposure device for exposing a target material by using a charged particle beam, a control method of the exposure device, and the use of the exposure device component manufacturing method. Background technique [0002] In recent years, in order to form circuit patterns with finer pitches than the resolution limit of ultraviolet light exposure equipment, there has been proposed an electron beam exposure equipment that uses electron beams to form dots smaller than the resolution limit of ultraviolet light exposure equipment. The spot of the electron beam is scanned against a target such as a wafer. [0003] In the electron beam exposure apparatus, high-speed deflection of the electron beam in the electron optical system can be realized, and the positional error of the stage holding the target can be ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/20G03F9/00H01L21/68
CPCH01J37/3177H01J37/20H01J2237/0264H01J2237/0216G03F1/20G03F7/20G03F7/70716G03F7/70758G03F7/70775H01L21/68G03F9/00G03F7/70725
Inventor 柴崎祐一
Owner NIKON CORP
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