Substrate table system and method for improving growth uniformity of diamond film by using same

A diamond film and substrate table technology, applied in metal material coating process, gaseous chemical plating, coating and other directions, can solve the problem of unsatisfactory diamond film growth uniformity, difficult substrate temperature distribution, excessive metal impurities and other problems, to achieve the effects of easy timely control, efficient temperature distribution, and simple processing technology.

Inactive Publication Date: 2018-08-10
WUHAN INSTITUTE OF TECHNOLOGY
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

Nowadays, even though there are many cavity design schemes to meet the microwave feed-in of two microwave frequencies of 2.45GHz and 915MHz, the coupling power has also been greatly improved[ 8,9 ], but the growth uniformity of the diamond film still cannot meet the requirements of many high-tech fields[ 10 ], the main reason has an important relationship with the structural design of the substrate stage system
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  • Substrate table system and method for improving growth uniformity of diamond film by using same
  • Substrate table system and method for improving growth uniformity of diamond film by using same

Examples

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Example Embodiment

[0039] Example 1:

[0040] A method for improving the uniformity of diamond film growth, specifically including the following steps:

[0041] S100, the processing and assembly of the substrate table system:

[0042] Choose the cold water pipe 1 with a diameter of 8mm, and arrange the pipes in the center area where the substrate stand 3 and the substrate table 4 are connected with the water pipe spacing of 2.5mm. Choose the cold water pipe 1 with a diameter of 5mm and arrange the water pipes at a distance of 4mm. In other areas where the substrate stage holder 3 and the substrate stage 4 are connected, the area where the 8mm water cooling pipe 1 is arranged occupies 1 / 4 to 1 / 2 of the total area (the area of ​​the substrate stage 4), and the 5mm water cooling pipe 1 The proportion of the arranged area is 1 / 2 to 3 / 4 of the total area (the area of ​​the substrate table 4). The brazing filler 2 is used to fill the gap between the water-cooled tube 1 and the substrate table support 3, whe...

Example Embodiment

[0047] Example 2:

[0048] A method for improving the uniformity of diamond film growth, specifically including the following steps:

[0049] S100, the processing and assembly of the substrate table system:

[0050] Choose the cold water pipe 1 with a diameter of 10mm, arrange the pipes in the center area where the substrate stand 3 and the substrate table 4 are connected with the water pipe spacing of 1.5mm, choose the cold water pipe 1 with a diameter of 6mm, and arrange the water pipes at a distance of 3mm In other areas where the substrate stage holder 3 and the substrate stage 4 are connected, the area where the 10mm water cooling pipe 1 is arranged occupies 1 / 4 to 1 / 2 of the total area (the area of ​​the substrate stage 4), and the 6mm water cooling pipe 1 The proportion of the arranged area is 1 / 2 to 3 / 4 of the total area (the area of ​​the substrate table 4). The brazing filler 2 is used to fill the gap between the water-cooled tube 1 and the substrate table support 3, where...

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Abstract

The invention relates to a substrate table system. The substrate table system comprises a substrate table, wherein water cooling pipes with different sizes are distributed below the substrate table indifferent areas. The method for improving the growth uniformity of a diamond film specifically comprises the following steps that the substrate table system is constructed; the diamond film is deposited, wherein in a cavity of a plasma ball generated by microwave discharge, the water cooling and heat dissipation efficiency of different areas of the substrate table is controlled, so that the substrate table has a high-to-low gradient heat dissipation effect from the center to the edge area, a uniform temperature distribution state is established on the surface of the substrate, and the purposeof improving the uniformity of the microwave plasma chemical vapor deposition diamond film is achieved; and a diamond film sample is taken out. The substrate table system has the beneficial effects of being easy to machine and mount, efficiently controlling the temperature of each area of the substrate table, effectively improving the uniformity of temperature distribution on the surface of the substrate table, and facilitating uniform deposition of the diamond film and the like.

Description

technical field [0001] The invention relates to the technical field of diamond film deposition, in particular to a substrate platform system and a method for improving the uniformity of diamond film growth by using the system. Background technique [0002] The excellent physical and chemical properties of diamond films have attracted widespread attention[ 1-3 ]. Nowadays, chemical vapor deposition (Chemical vapor deposition, CVD) technology is one of the main technologies for preparing diamond films. Among them, microwave CVD (Microwave plasma CVD, MPCVD) method has the advantages of electrodeless discharge, high energy conversion efficiency, and pure plasma. It is the primary method to prepare high-quality diamond films[ 4 ]. [0003] Over the years, one of the difficulties to be overcome in the preparation of diamond films by using MPCVD technology is how to improve the uniformity of diamond film deposition. A diamond film with high uniformity will not only reduce the ...

Claims

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Application Information

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IPC IPC(8): C23C16/27C23C16/458C23C16/511
CPCC23C16/274C23C16/4586
Inventor 翁俊罗凯余军火汪建华
Owner WUHAN INSTITUTE OF TECHNOLOGY
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