Anti-reflection substrate and method of making the same
A manufacturing method and anti-reflection technology, which is applied in the direction of instruments, optics, optical components, etc., can solve the problems of moth-eye anti-reflection microstructure application limitations, low production efficiency or production yield, complex production process, etc., and achieve excellent anti-reflection Features, low production cost, and simple process
Active Publication Date: 2020-04-28
TCL CHINA STAR OPTOELECTRONICS TECH CO LTD
View PDF4 Cites 0 Cited by
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
[0004] At present, the methods for preparing moth-eye anti-reflection microstructures on substrates mainly include electron beam etching, photolithography, and nanoimprinting. The above-mentioned methods are complex in production process and require high technical requirements when preparing moth-eye anti-reflection microstructures. And usually need to use more expensive equipment, its higher cost and lower production efficiency or production yield limit the application development of this technology, so that the application of moth-eye anti-reflection microstructure is greatly limited
Method used
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View moreImage
Smart Image Click on the blue labels to locate them in the text.
Smart ImageViewing Examples
Examples
Experimental program
Comparison scheme
Effect test
Embodiment Construction
[0038] In order to further illustrate the technical means adopted by the present invention and its effects, the following describes in detail in conjunction with preferred embodiments of the present invention and accompanying drawings.
[0039] see figure 1 , the invention provides a method for manufacturing an anti-reflection substrate, comprising the following steps:
[0040] Step S1, such as figure 2 As shown, a block copolymer dispersion solution and a substrate 10 are provided, and the block copolymer dispersion solution is coated on the substrate 10 to form a polymer film 20;
[0041] The block copolymer dispersion solution includes a solvent and a block copolymer dispersed in the solvent; the molecular structure of the block copolymer contains two or more thermodynamically incompatible polymers.
[0042] Specifically, the block copolymer includes at least one of a first compound having a first general structural formula and a second compound having a second general s...
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More PUM
| Property | Measurement | Unit |
|---|---|---|
| diameter | aaaaa | aaaaa |
| diameter | aaaaa | aaaaa |
| distance | aaaaa | aaaaa |
Login to View More
Abstract
The invention provides an antireflective substrate and a manufacturing method thereof. The manufacturing method of the antireflective substrate includes the following steps: mixing a block polymer anda solvent together and then coating the substrate with the block polymer and solvent mixture to form a polymer film, carrying out annealing on the polymer film after the solvent in the polymer film volatilizes to form an antireflective film with a moth-eye antireflective microstructure, and finally obtaining the antireflective substrate. The method is simple in process, low in cost and high in production efficiency, and no complicated and expensive equipment is needed. The antireflective film in the antireflective substrate has a moth-eye antireflective microstructure, so the antireflective film has the excellent antireflective characteristic and thus the antireflective substrate is ultra low in reflectivity. Moreover, manufacturing procedures of the antireflective substrate are simple and manufacturing costs of the antireflective substrate are low.
Description
technical field [0001] The invention relates to the field of display technology, in particular to an anti-reflection substrate and a manufacturing method thereof. Background technique [0002] The surface of an electronic display usually needs to have various functions such as anti-damage, anti-external light reflection, and anti-fouling. Among them, the anti-external light reflection function is particularly important for the display effect of the display. The method of preventing the reflection of external light is to cover the surface of the display with a low reflection (LR, Low Reflection) layer. However, the reflected light generated by the contact interface between the LR layer and the air and the contact interface between the LR layer and the polarizer does not It will disappear completely, that is to say, the anti-reflection effect of the LR layer is not sufficient. When light sources such as fluorescent lamps are reflected in the display, it is still difficult for ...
Claims
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More Application Information
Patent Timeline
Login to View More Patent Type & Authority Patents(China)
IPC IPC(8): G02B1/118G02B1/04
CPCG02B1/04G02B1/118
Inventor 韦宏权石钰陈孝贤
Owner TCL CHINA STAR OPTOELECTRONICS TECH CO LTD