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Microchannel plate with ultralow-temperature stable resistance-temperature characteristic and fabrication method thereof

A technology of temperature resistance characteristics and micro-channel plate, which is applied in the manufacture of light-emitting cathodes, secondary emitter electrodes, electrode devices with multiple dynodes, etc., can solve the problem of reducing the resistance of the micro-channel plate and the high resistance of the micro-channel quantum signal Fast reading and other issues to achieve the effect of improving the stability of temperature resistance coefficient, reducing ultra-low temperature body resistance, and fast signal reading

Active Publication Date: 2018-09-04
CHINA BUILDING MATERIALS ACAD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Therefore, the high body resistance at ultra-low temperature is the main bottleneck for the rapid reading of quantum signals in microchannels.
However, there are no relevant patents or literature reports on reducing the resistance of microchannel plates under ultra-low temperature conditions from the perspective of temperature resistance modification and stabilization.

Method used

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  • Microchannel plate with ultralow-temperature stable resistance-temperature characteristic and fabrication method thereof
  • Microchannel plate with ultralow-temperature stable resistance-temperature characteristic and fabrication method thereof
  • Microchannel plate with ultralow-temperature stable resistance-temperature characteristic and fabrication method thereof

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preparation example Construction

[0048] An embodiment of the present invention proposes a method for preparing a microchannel plate with ultra-low temperature stable temperature resistance characteristics, which includes:

[0049] preparing a conductive layer on the inner wall of the microchannel plate substrate;

[0050] preparing a secondary electron emission layer on the conductive layer;

[0051] A temperature-resistance property modified layer is prepared on the secondary electron emission layer to obtain a microchannel plate with ultra-low temperature stable temperature resistance property.

[0052] The conductive layer and the secondary electron emission layer are formed in situ or directly plated.

[0053] The preparation of the temperature resistance characteristic modification layer includes: ultrasonically cleaning the micro-channel plate substrate, placing it in a vacuum reaction chamber for atomic layer deposition, using clean gas to continuously clean, keeping the pressure in the reaction chamb...

Embodiment 1

[0072] An embodiment of the present invention proposes a method for preparing a microchannel plate with ultra-low temperature stable temperature resistance characteristics, which includes:

[0073] Select a material suitable for preparing millions of micron-scale apertures with independent hollow channels as the micro-channel plate substrate; the upper and lower surfaces of the substrate are plated with Ni / Cr surface electrodes;

[0074] preparing a conductive layer on the inner wall of the microchannel plate substrate;

[0075] preparing a secondary electron emission layer on the conductive layer;

[0076] Prepare a temperature resistance characteristic modified layer on the secondary electron emission layer: ultrasonically clean the microchannel plate substrate, then perform ultrasonication on the microchannel plate substrate for 10 minutes with acetone and 10 minutes with isopropanol, and bake in an oven at 95°C for 30 minutes , placed in the vacuum reaction chamber for atom...

Embodiment 2

[0098] An embodiment of the present invention proposes a method for preparing a microchannel plate with ultra-low temperature stable temperature resistance characteristics, which includes:

[0099] Select a material suitable for preparing millions of micron-scale apertures with independent hollow channels as the micro-channel plate substrate; the upper and lower surfaces of the substrate are plated with Ni / Cr surface electrodes;

[0100] preparing a conductive layer on the inner wall of the microchannel plate substrate;

[0101] preparing a secondary electron emission layer on the conductive layer;

[0102] Prepare a temperature resistance characteristic modified layer on the secondary electron emission layer: ultrasonically clean the microchannel plate substrate, then perform ultrasonication on the microchannel plate substrate for 10 minutes with acetone and 10 minutes with isopropanol, and bake in an oven at 95°C for 30 minutes , placed in the vacuum reaction chamber for at...

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Abstract

The invention relate to a microchannel plate with ultralow-temperature stable resistance-temperature characteristic and a fabrication method thereof. The fabrication method comprises the steps of fabricating a conductive layer on an inner wall of a microchannel plate substrate; fabricating a secondary electron emission layer on the conductive layer; and fabricating a resistance-temperature characteristic modification layer on the secondary electron emission layer to obtain the microchannel plate with ultralow-temperature stable resistance-temperature characteristic. The resistance-temperaturecharacteristic modification layer which still has favorable positive resistant-temperature characteristic under an ultralow-temperature condition is deposited on a surface of the inner wall of a micropore passage of the microchannel plate by an atomic layer deposition technology, so that the trend that the resistance of the microchannel plate is abruptly increased with a temperature under the ultralow-temperature condition is reduced, the high-stable temperature-resistance characteristic of the microchannel plate under the ultralow-temperature condition is achieved, the ultralow-temperature bulk resistance of the microchannel plate is reduced, and the ultrafast signal reading capability and the response capability of the microchannel plate under the ultralow-temperature condition are improved.

Description

technical field [0001] The invention relates to a microchannel plate and a preparation method thereof, in particular to a microchannel plate with ultra-low temperature stable temperature resistance characteristics and a preparation method thereof. Background technique [0002] A microchannel plate is a special glass material and device that parallelly multiplies the flow of charged particles distributed in two-dimensional space. With its advantages of high time resolution, high spatial resolution, high signal magnification, and compact structure, microchannel plates have become the most potential important devices for low-temperature quantum analog computing signal readout. Microchannel plates are usually used at room temperature, and the general volume resistance is 100-200MΩ. Low-temperature quantum simulation calculation requires the signal readout device to be under the condition that the temperature is not higher than 30K, and the signal reading time is not higher than...

Claims

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Application Information

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IPC IPC(8): H01J9/12H01J43/24C23C16/40C23C16/455
CPCC23C16/404C23C16/405C23C16/45525H01J9/125H01J43/246
Inventor 蔡华徐滔许阳蕾薄铁柱李庆廉姣周东站刘辉
Owner CHINA BUILDING MATERIALS ACAD
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