Insulated gate bipolar transistor device, fabrication method thereof and power electronic equipment
A technology of bipolar transistor and manufacturing method, applied in semiconductor/solid-state device manufacturing, semiconductor device, circuit and other directions, can solve the problem of small size of insulated gate bipolar transistor device, increasing difficulty of manufacturing process, trench gate structure The problem of high integration level, to achieve the effect of suppressing the latch-up effect, increasing the area, and improving the quality
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[0054] In order to make the objectives, technical solutions and advantages of the present invention clearer, the following examples are used to further describe the present invention in detail.
[0055] When referring to ordinal numbers such as "first", "second" or "third" herein, unless they really express the meaning of the order according to the context, it should be understood as only for the purpose of distinction.
[0056] like figure 1 and figure 2 As shown, in the related art, an insulated gate bipolar transistor device with a trench gate structure includes an N-type semiconductor substrate 02 , and a trench-gate structure is provided on one side of the N-type semiconductor substrate 02 and along a distance away from the N-type semiconductor substrate 02 . The P-type well 03, the N-type source region 04, the dielectric layer 05 and the metal layer 06 are arranged in sequence, wherein: the overall structure of the N-type semiconductor substrate 02, the P-type well 03 ...
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