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Brightness enhancement film crystalline silicon solar cell panel and manufacturing method thereof

A technology for solar panels and crystalline silicon cells, applied in photovoltaic power generation, final product manufacturing, sustainable manufacturing/processing, etc., can solve problems such as poor light-enhancing effects, reduce reflectivity, improve anti-reflection effects, and improve short-circuit current Effect

Pending Publication Date: 2018-11-02
CHANGZHOU ALMADEN
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] The purpose of the present invention is to provide a crystalline silicon solar cell panel with a light-enhancing film and its manufacturing method, which solves the technical problem that the current crystalline silicon solar cell sheet has poor light-enhancing effects near multiple wavelength bands

Method used

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  • Brightness enhancement film crystalline silicon solar cell panel and manufacturing method thereof
  • Brightness enhancement film crystalline silicon solar cell panel and manufacturing method thereof
  • Brightness enhancement film crystalline silicon solar cell panel and manufacturing method thereof

Examples

Experimental program
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Effect test

Embodiment 1

[0026] like figure 1 A crystalline silicon solar panel with a brightness enhancement film as shown includes a crystalline silicon cell substrate 1 , an antireflection film stack 2 is provided on the crystalline silicon cell substrate 1 , and a brightness enhancement film 3 is provided on the antireflection film stack 2 .

[0027] The material of the anti-reflection film stack 2 is SiNx or SiOx, the thickness of the anti-reflection film stack 2 is 70-120 nm, and the refractive index of the anti-reflection film stack 2 is 1.8-2.3.

[0028] The material of the brightness enhancement film 3 is AlOx or SiOx.

[0029] The refractive index of the enhancement film 3 is 1.2-1.4, and the thickness is 20-80 nm.

[0030] The refractive index of the enhancement film 3 is 1.6-1.8, and the thickness is 60-140 nm.

[0031] The crystalline silicon cell substrate 1 is provided with thin grid lines and main grid lines, and the brightness enhancement film 3 is arranged on the anti-reflection fi...

Embodiment 2

[0034] A method for manufacturing a crystalline silicon solar cell panel with a brightness enhancement film is a method for manufacturing a crystalline silicon solar cell panel with a brightness enhancement film described in Embodiment 1, comprising the following steps:

[0035] Step 1: uniformly coat the brightness enhancing film material on the crystalline silicon battery substrate 1 by spraying, brushing or rolling;

[0036] Step 2: The crystalline silicon battery substrate 1 coated with the brightness enhancement film material is put into a high-temperature box for curing, the curing temperature is 90-200 degrees, and the curing time is 0.1-10 minutes. The high-temperature box is used for curing by hot air or infrared;

[0037] Step 3: Perform stringing and stacking processing on the crystalline silicon battery substrate 1 after high-temperature curing.

[0038] Before performing step 1, first use a shielding material to shield the busbars on the crystalline silicon cell s...

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Abstract

The invention discloses a brightness enhancement film crystalline silicon solar cell panel and a manufacturing method thereof, belonging to the technical field of crystalline silicon solar cells. Thebrightness enhancement film crystalline silicon solar cell panel comprises a crystalline silicon cell substrate (1), wherein an anti-reflection film stack (2) is arranged on the crystalline silicon cell substrate (1), and a brightness enhancement film (3) is arranged on the anti-reflection film stack (2). Thereby, the technical problem that a current crystalline silicon solar cell sheet has a poorbrightness enhancement effect near multiple wave bands can be solved, a better anti-reflection effect can be achieved, the reflectivity of the short-wave part of the crystalline silicon solar cell can be reduced, and the short-circuit current of the solar cell can be improved.

Description

technical field [0001] The invention belongs to the technical field of crystalline silicon solar cells. Background technique [0002] The current anti-reflection coating on the crystalline silicon solar cell is SiNx, which adopts PECVD coating technology. PECVD coating technology has problems such as high coating cost and difficult refraction adjustment. The current SiNx has a refractive index between 2.0 and 2.2 and a thickness of 60 to 100nm. However, the refractive index of packaging materials for crystalline silicon solar cell modules is between 1.46 and 1.52, and the use of single-layer or graded SiNx with a refractive index between 2.0 and 2.2 can only achieve good anti-reflection effects for a small range of wavelengths. Contents of the invention [0003] The object of the present invention is to provide a crystalline silicon solar cell panel with a brightness enhancement film and a manufacturing method thereof, which solves the technical problem that the existing ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L31/0216H01L31/048H01L31/18
CPCH01L31/02168H01L31/048H01L31/18Y02E10/50Y02P70/50
Inventor 苏维燕林金锡王国祥林金汉林俊良
Owner CHANGZHOU ALMADEN