The application discloses an HJT
solar cell and a preparation method thereof. The preparation method comprises the following steps: providing a
heterojunction cell substrate, depositing a transparent
conductive oxide layer on both sides of the
heterojunction cell substrate, manufacturing a
mask layer on the surface of the transparent
conductive oxide layer, performing a patterned opening treatment on the
mask layer to form a
mask layer with a patterned opening, performing roughening, pre-impregnation and
metal activation treatment in sequence at the patterned opening of the
mask layer in a dark environment to obtain a pretreated
heterojunction cell substrate, and performing pre-plating, deoxidation,
copper electroplating, film stripping and chemical
tin plating treatment on the pretreated heterojunction
cell substrate in sequence to obtain the HJT
solar cell. In the method, the
copper seed layer of PVD
sputtering and
etching are not needed on both sides of the cell, the
discharge of
copper-containing
wastewater is avoided, the TCO damage caused by the
etching of the copper seed layer is reduced, the invalid
line width shielding area is reduced, and the defects of the traditional technology are overcome.