High-order diffraction suppression raster with large process tolerance

An advanced diffraction and latitude technology, which is applied in the field of diffractive optics, can solve the problems such as the processing precision of advanced diffraction suppression grating performance controlled primitives, and achieve the effect of being beneficial to batch processing and improving process latitude.

Active Publication Date: 2018-11-06
LASER FUSION RES CENT CHINA ACAD OF ENG PHYSICS
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  • Abstract
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  • Claims
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Problems solved by technology

[0007] The technical problem to be solved by the present invention is: to provide an advanced diffraction suppression grating with a large process tolerance, and to solve the problem that the performance of the existing advanced diffraction suppression grating is limited by the processing accuracy of the element

Method used

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  • High-order diffraction suppression raster with large process tolerance
  • High-order diffraction suppression raster with large process tolerance
  • High-order diffraction suppression raster with large process tolerance

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Embodiment

[0033] This embodiment provides an advanced diffraction suppression grating with a large process latitude in the energy range of soft X-rays. Refer to figure 1 and figure 2 . An advanced diffraction-suppressing grating with a large process tolerance, comprising an opaque substrate 1; a plurality of polygonal primitives 2 with the same shape and area and not intersecting each other are provided on the opaque substrate 1, wherein the polygonal primitives 2 are in The square lattice is quasi-randomly distributed on the opaque substrate 1 .

[0034] Specifically, a plurality of rectangular areas 3 are arranged on the opaque substrate 1, and the plurality of rectangular areas 3 are arranged periodically in a square lattice, and the period of the square lattice is d, and each rectangular area 3 has and only A polygon primitive 2 whose centers are randomly distributed within a rectangular area.

[0035] It should be noted that the embodiment of the present invention does not limi...

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Abstract

The invention discloses a high-order diffraction suppression grating with large process tolerance, comprising a light-proof substrate. The light-proof substrate is provided with a plurality of polygonal primitives having the same shape and the same area and not intersecting with each other, wherein the polygonal primitives have quasi-random distribution in a square array on the light-proof substrate. The light-proof substrate is provided with a plurality of rectangular regions, the plurality of rectangular regions are periodically arranged in a square array, the period of the square array is d, each rectangular region has only one polygon primitive, and the center of the polygonal primitive is randomly distributed in the rectangular region. Compared with the existing high-order diffractionsuppression raster, the process difficulty is effectively reduced, the problem that high-order diffraction is reintroduced due to the primitive processing error is solved; and 2n- and 3n-order (n isa non-zero integer) high-order diffraction can be effectively suppressed in each of the infrared, visible, extreme ultraviolet, soft X-ray, and the like, so as to provide the technical guarantee and process support for improving the spectral measurement accuracy and the monochromatic spectral purity.

Description

technical field [0001] The invention relates to the field of diffraction optics, in particular to an advanced diffraction suppression grating with large process tolerance. Background technique [0002] Advanced Diffraction Suppression Grating is a new type of grating that can effectively reduce the intensity of advanced diffraction. It uses a variety of elements arranged according to certain rules to replace the grooves, grooves, slots and other structures in traditional gratings, and is expected to fundamentally solve the problem of high-order harmonic pollution in the spectral measurement of broadband light sources and the monochromatization process. Considering the particularity of its layout structure, electron beam lithography is mainly used for processing, but the processing accuracy of primitives has always been an important factor affecting its performance. [0003] A representative design is called quantum lattice grating (Wang C, Kuang L, et al.Rev.Sci.Instrum, 20...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G02B5/18
CPCG02B5/1861G02B5/1866G02B2005/1804
Inventor 魏来陈勇杨祖华范全平巫殷忠曹磊峰
Owner LASER FUSION RES CENT CHINA ACAD OF ENG PHYSICS
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