Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Electrochemical deposition support for preparing nano material

A nanomaterial, electrochemical technology, applied in anodizing, electrolytic coating, surface reaction electrolytic coating, etc., can solve the problems of long-term effective use of the device, electrolyte acid penetration, poor sealing performance, etc. Long-term effective use, increase effective use area, and prevent corrosion

Pending Publication Date: 2018-11-20
SHENZHEN TOPMEMBRANES INC
View PDF5 Cites 2 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

During the preparation process of the current AAO porous nano-template, due to the absence of a suitable standard support bracket, the self-made mechanism of the researchers is complex and inapplicable. The substrate used to prepare the AAO porous nano-template is prone to fracture due to its thin thickness. Moreover, the sealing performance is poor, and the acid solution of the electrolyte often penetrates, causing corrosion to the wires connected to the substrate, making the device unable to be used effectively for a long time, which is not conducive to the application of large-scale industrialization

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Electrochemical deposition support for preparing nano material
  • Electrochemical deposition support for preparing nano material
  • Electrochemical deposition support for preparing nano material

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0027] Embodiment 1 of the present invention: a kind of electrochemical deposition support for preparing nanomaterials, such as Figure 1-Figure 3 As shown, it includes a base 1, a front cover 2, a bracket base 3 and a conductive component 4, the base 1 is fixed through the front cover 2 and the bracket base 3, the conductive component 4 is arranged on the bracket base 3, and the base 1 is connected to the conductive component 4, and a through hole A5 is opened through the front cover plate 2, and the end of the through hole A5 away from the bracket base 3 is provided with a chamfer, and the chamfer makes the through hole A5 far away from the bracket base 3 One end of the slant is formed to be more open, which improves the fluidity of the electrolyte in the through hole A5, ensures the uniformity of the growth of the nanowires, and increases the effective use area of ​​the prepared nanomembrane. The substrate 1 can be made of sapphire, silicon wafer, glass, etc., and the subst...

Embodiment 2

[0033] Embodiment 2: A kind of electrochemical deposition support for preparing nanomaterials, such as Figure 1-Figure 3As shown, it includes a base 1, a front cover 2, a bracket base 3 and a conductive component 4, the base 1 is fixed through the front cover 2 and the bracket base 3, the conductive component 4 is arranged on the bracket base 3, and the base 1 is connected to the conductive component 4, and a through hole A5 is opened through the front cover plate 2, and the end of the through hole A5 away from the bracket base 3 is provided with a chamfer, and the chamfer makes the through hole A5 far away from the bracket base 3 One end of the slant is formed to be more open, which improves the fluidity of the electrolyte in the through hole A5, ensures the uniformity of the growth of the nanowires, and increases the effective use area of ​​the prepared nanomembrane. The substrate 1 can be made of sapphire, silicon wafer, glass, etc., and the substrate 1 is coated with alum...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention relates to the technical field of anodic aluminum oxide porous membranes, in particular to an electrochemical deposition support for preparing a nano material. The support comprises a substrate, a front cover plate, a support base and a conductive assembly, the substrate is fixed through the front cover plate and the support base, the conductive assembly is arranged on the support base, the substrate is connected with the conductive assembly, and a through hole A is further formed in the front cover plate in a penetrating mode. According to the support, the structure is stable, the fixing effect of the substrate is good, the sealing performance is good, and the conductive assembly can be prevented from being corroded by an electrolyte; the whole body is of an assembly type structure, no glue or bonding structure is arranged, disassembling, assembling and parts replacement are easy, and the long-term effective use of the device is facilitated.

Description

technical field [0001] The invention relates to the technical field of anodized aluminum oxide porous membranes, in particular to an electrochemical deposition support for preparing nanometer materials. Background technique [0002] AAO porous nano template is a kind of anodized aluminum template, which has the advantages of uniform distribution of pore height, uniform pore size, controllable pore shape and large surface area, and has a good market application prospect. Using double-pass AAO as a template, metal nanowires with high aspect ratio and high density can be conveniently prepared by electrochemical deposition. Importantly, in order to ensure that the nanowires grow only in the nanopores inside the template, the template must be effectively sealed, leaving only the parts that need to be reacted exposed in the electrolyte. In addition, in order to ensure the uniformity of the nanowire growth process, it is necessary to fully consider the influence of the structure o...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): C25D11/04
CPCC25D11/005C25D11/045
Inventor 郭秋泉赵呈春杨军
Owner SHENZHEN TOPMEMBRANES INC
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com